Arsenic surface complexation behavior in aqueous systems onto Al substituted Ni, Co, Mn, and Cu based ferrite nano adsorbents.

Adsorption Arsenic Surface complexation Ternary metal oxides XAS (XANES, EXAFS)

Journal

Journal of hazardous materials
ISSN: 1873-3336
Titre abrégé: J Hazard Mater
Pays: Netherlands
ID NLM: 9422688

Informations de publication

Date de publication:
05 01 2019
Historique:
received: 25 03 2018
revised: 07 07 2018
accepted: 11 07 2018
pubmed: 3 10 2018
medline: 3 10 2018
entrez: 2 10 2018
Statut: ppublish

Résumé

The present study is about surface complexation behavior of arsenic species adsorbed onto ternary metal oxide adsorbents (Ni-Al-Fe, Co-Al-Fe, Mn-Al-Fe, and Cu-Al-Fe). The analysis is carried out by X-ray absorption spectroscopy (XAS) tool. XANES (μ(E) vs. E) spectra close to the absorption edge (i.e., As K-edge) of all samples are observed along with the As(III) and As(V) standards. The first derivative of XANES for Ni-As(V), and Cu-As(V) samples agree with that of As(V) standards, respectively. Whereas, As(III) adsorbed adsorbent systems (i.e., Ni, Co, Mn, and Cu) are observed with mixed oxidation state of arsenic. A total of 65-85 % is observed with initial oxidation state (As(III) or As(V)), and remaining 15-35 % is observed with modified oxidation state (As(V) or As(III)) that explains the occurrence of possible charge transfer. EXAFS analysis shows the As-O bond distances in the range of 1.7-1.8 Å. The corresponding As-M bond distances are around 2.7, 3.2, and 3.6 Å which confirms the formation various edge sharing (

Identifiants

pubmed: 30273858
pii: S0304-3894(18)30585-5
doi: 10.1016/j.jhazmat.2018.07.056
pii:
doi:

Types de publication

Journal Article Research Support, Non-U.S. Gov't

Langues

eng

Sous-ensembles de citation

IM

Pagination

383-393

Informations de copyright

Copyright © 2018 Elsevier B.V. All rights reserved.

Auteurs

Yaswanth K Penke (YK)

Materials Science Programme, Indian Institute of Technology Kanpur, Kanpur, 208016, India. Electronic address: yassu@iitk.ac.in.

Nidhi Tiwari (N)

Atomic & Molecular Physics division, Bhabha Atomic Research Centre, Mumbai, 400085, India.

Shambunath Jha (S)

Atomic & Molecular Physics division, Bhabha Atomic Research Centre, Mumbai, 400085, India.

Dibyendu Bhattacharyya (D)

Atomic & Molecular Physics division, Bhabha Atomic Research Centre, Mumbai, 400085, India.

Janakarajan Ramkumar (J)

Materials Science Programme, Indian Institute of Technology Kanpur, Kanpur, 208016, India; Department of Mechanical Engineering, Indian Institute of Technology Kanpur, Kanpur, 208016, India. Electronic address: jrkumar@iitk.ac.in.

Kamal K Kar (KK)

Materials Science Programme, Indian Institute of Technology Kanpur, Kanpur, 208016, India; Department of Mechanical Engineering, Indian Institute of Technology Kanpur, Kanpur, 208016, India. Electronic address: kamalkk@iitk.ac.in.

Classifications MeSH