Kossel Effect in Periodic Multilayers.


Journal

Journal of nanoscience and nanotechnology
ISSN: 1533-4880
Titre abrégé: J Nanosci Nanotechnol
Pays: United States
ID NLM: 101088195

Informations de publication

Date de publication:
01 Jan 2019
Historique:
entrez: 18 10 2018
pubmed: 18 10 2018
medline: 18 10 2018
Statut: ppublish

Résumé

The Kossel effect is the diffraction by a periodically structured medium, of the characteristic X-ray radiation emitted by the atoms of the medium. We show that multilayers designed for X-ray optics applications are convenient periodic systems to use in order to produce the Kossel effect, modulating the intensity emitted by the sample in a narrow angular range defined by the Bragg angle. We also show that excitation can be done by using photons (X-rays), electrons or protons (or charged particles), under near normal or grazing incident geometries, which makes the method relatively easy to implement. The main constraint comes from the angular resolution necessary for the detection of the emitted radiation. This leads to small solid angles of detection and long acquisition times to collect data with sufficient statistical significance. Provided this difficulty is overcome, the comparison or fit of the experimental Kossel curves, i.e., the angular distributions of the intensity of an emitted radiation of one of the element of the periodic stack, with the simulated curves enables getting information on the depth distribution of the elements throughout the multilayer. Thus the same kind of information obtained from the more widespread method of X-ray standing wave induced fluorescence used to characterize stacks of nanometer period, can be obtained using the Kossel effect.

Identifiants

pubmed: 30327074
doi: 10.1166/jnn.2019.16472
doi:

Types de publication

Journal Article

Langues

eng

Pagination

593-601

Auteurs

Karine Le Guen (KL)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique - Matière et Rayonnement, boîte courrier 1140, 4 place JussieuF-75252 Paris cedex 05, France.

Jean-Michel André (JM)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique - Matière et Rayonnement, boîte courrier 1140, 4 place JussieuF-75252 Paris cedex 05, France.

Meiyi Wu (M)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique - Matière et Rayonnement, boîte courrier 1140, 4 place JussieuF-75252 Paris cedex 05, France.

Vita Ilakovac (V)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique - Matière et Rayonnement, boîte courrier 1140, 4 place JussieuF-75252 Paris cedex 05, France.

Franck Delmotte (F)

Laboratoire Charles Fabry, Institut d'Optique GraduateSchool, CNRS, Université Paris-Saclay, 91127 Palaiseau Cedex, France.

Sébatien de Rossi (S)

Laboratoire Charles Fabry, Institut d'Optique GraduateSchool, CNRS, Université Paris-Saclay, 91127 Palaiseau Cedex, France.

Françoise Bridou (F)

Laboratoire Charles Fabry, Institut d'Optique GraduateSchool, CNRS, Université Paris-Saclay, 91127 Palaiseau Cedex, France.

Evgueni Meltchakov (E)

Laboratoire Charles Fabry, Institut d'Optique GraduateSchool, CNRS, Université Paris-Saclay, 91127 Palaiseau Cedex, France.

Angelo Giglia (A)

CNR, Istituto Officina Materiali 34149 Trieste, Italy.

Stefano Nannarone (S)

CNR, Istituto Officina Materiali 34149 Trieste, Italy.

Zhanshan Wang (Z)

Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P. R. China.

Qiushi Huang (Q)

Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P. R. China.

Zhong Zhang (Z)

Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P. R. China.

Jingtao Zhu (J)

Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P. R. China.

Yuchun Tu (Y)

Shanghai Institute of Laser Plasma, Shanghai 201800, P. R. China.

Yanyan Yuan (Y)

Jiangsu University of Science and Technology, School of Materials Science and Engineering, Mengxi Road 2, Zhenjiang, Jiangsu Province, 212003, P. R. China.

Ian Vickridge (I)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Institut des NanoSciences de Paris, boîte courrier 840, 4 place Jussieu, F-75252 Paris cedex 05, France.

Didier Schmaus (D)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Institut des NanoSciences de Paris, boîte courrier 840, 4 place Jussieu, F-75252 Paris cedex 05, France.

Emrick Briand (E)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Institut des NanoSciences de Paris, boîte courrier 840, 4 place Jussieu, F-75252 Paris cedex 05, France.

Sébastien Steydli (S)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Institut des NanoSciences de Paris, boîte courrier 840, 4 place Jussieu, F-75252 Paris cedex 05, France.

Philippe Walter (P)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire d'Archeìologie Moleìculaire et Structurale (LAMS), boîte courrier 225, 4 place Jussieu, F-75005 Paris, France.

Philippe Jonnard (P)

Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique - Matière et Rayonnement, boîte courrier 1140, 4 place JussieuF-75252 Paris cedex 05, France.

Classifications MeSH