Improved pH Sensitivity and Reliability for Extended Gate Field-Effect Transistor Sensors Using High-


Journal

Journal of nanoscience and nanotechnology
ISSN: 1533-4880
Titre abrégé: J Nanosci Nanotechnol
Pays: United States
ID NLM: 101088195

Informations de publication

Date de publication:
01 03 2019
Historique:
entrez: 25 11 2018
pubmed: 25 11 2018
medline: 25 11 2018
Statut: ppublish

Résumé

In this study, we fabricated extended-gate (EG) field-effect transistor (FET) pH sensors with dualgate (DG) structures, using a range of dielectric sensing membranes (SiO₂, Si₃N₄, HfO₂ and Ta₂O

Identifiants

pubmed: 30469200
doi: 10.1166/jnn.2019.16222
doi:

Types de publication

Journal Article Research Support, Non-U.S. Gov't

Langues

eng

Sous-ensembles de citation

IM

Pagination

1425-1431

Auteurs

Joo-Won Kang (JW)

Department of Electronic Materials Engineering, Kwangwoon University, 20 Kwangwoon-ro, Nowon-Gu, Seoul 01897, Republic of Korea.

Won-Ju Cho (WJ)

Department of Electronic Materials Engineering, Kwangwoon University, 20 Kwangwoon-ro, Nowon-Gu, Seoul 01897, Republic of Korea.

Classifications MeSH