Electrical Stability of Solution-Processed Indium Oxide Thin-Film Transistors.


Journal

Journal of nanoscience and nanotechnology
ISSN: 1533-4880
Titre abrégé: J Nanosci Nanotechnol
Pays: United States
ID NLM: 101088195

Informations de publication

Date de publication:
01 Apr 2019
Historique:
entrez: 30 11 2018
pubmed: 30 11 2018
medline: 30 11 2018
Statut: ppublish

Résumé

We investigated the electrical stability of bottom-gate/top-contact-structured indium oxide (In₂O₃) thin-film transistors (TFTs) in atmospheric air and under vacuum. The solution-processed In₂O₃ film exhibits a nanocrystalline morphology with grain boundaries. The fabricated In₂O₃ TFTs operate in an

Identifiants

pubmed: 30487002
doi: 10.1166/jnn.2019.16005
doi:

Types de publication

Journal Article

Langues

eng

Pagination

2371-2374

Auteurs

Hyeonju Lee (H)

Department of Electronic Engineering, Hallym University, Chuncheon 24252, Korea.

Jin-Hyuk Kwon (JH)

School of Electronics, Kyungpook National University, Daegu 41566, Korea.

Jin-Hyuk Bae (JH)

School of Electronics, Kyungpook National University, Daegu 41566, Korea.

Jaehoon Park (J)

Department of Electronic Engineering, Hallym University, Chuncheon 24252, Korea.

Cheonghoon Seo (C)

Department of Rehabilitation Medicine, Hallym University, College of Medicine, Seoul 07247, Korea.

Classifications MeSH