Steric and Electronic Effects of Electrochemically Generated Aryl Radicals on Grafting of the Graphite Surface.


Journal

Langmuir : the ACS journal of surfaces and colloids
ISSN: 1520-5827
Titre abrégé: Langmuir
Pays: United States
ID NLM: 9882736

Informations de publication

Date de publication:
12 Feb 2019
Historique:
pubmed: 11 1 2019
medline: 11 1 2019
entrez: 11 1 2019
Statut: ppublish

Résumé

Grafting of aryl radicals generated by electrochemical reduction of aryldiazonium salts has been extensively studied on various surfaces. However, there exists two unclear aspects; the first one is the generality of the blocking ability of simple functional groups toward multilayer growth, and the second one is the electronic impact of substituent groups of aryl radicals on grafting efficiency. To address these aspects, we have studied the electrochemical functionalization of graphite using aryldiazonium salts having electron-donating or electron-withdrawing groups at the 3,4,5-positions. Atomic force microscopy investigation of the functionalized surfaces revealed the formation of monolayers for all aryldiazonium salts, and thus, nitro, carboxy, ester, methyl, and methoxy groups at the 3,4,5-positions of the benzene ring suppress polyaryl growth. The degree of grafting estimated by scanning tunneling microscopy imaging and Raman spectroscopy of the functionalized surfaces depends on the electronic state of the aryl radicals, in which the radicals with electron-donating groups show a high degree of functionalization, whereas those with electron-withdrawing groups exhibit a low degree of functionalization. We discuss several possibilities that affect grafting density. Though there are several factors, we hypothesize that one factor to explain the observed reactivity trend is the electronic property of the aryl radicals, namely, the relative position of the singly occupied molecular orbital energy levels of the aryl radicals with respect to the graphite Fermi energy level.

Identifiants

pubmed: 30626188
doi: 10.1021/acs.langmuir.8b03339
doi:

Types de publication

Journal Article

Langues

eng

Pagination

2089-2098

Auteurs

Kazukuni Tahara (K)

Division of Frontier Materials Science, Graduate School of Engineering Science , Osaka University , Toyonaka , Osaka 560-8531 , Japan.
Department of Applied Chemistry, School of Science and Technology , Meiji University , 1-1-1 Higashimita , Tama-ku, Kawasaki , Kanagawa 214-8571 , Japan.
PRESTO, Japan Science and Technology Agency , 4-1-8, Honcho , Kawaguchi , Saitama 332-0012 , Japan.

Yuki Kubo (Y)

Division of Frontier Materials Science, Graduate School of Engineering Science , Osaka University , Toyonaka , Osaka 560-8531 , Japan.

Benjamin Lindner (B)

Division of Frontier Materials Science, Graduate School of Engineering Science , Osaka University , Toyonaka , Osaka 560-8531 , Japan.

Shingo Hashimoto (S)

Department of Applied Chemistry, School of Science and Technology , Meiji University , 1-1-1 Higashimita , Tama-ku, Kawasaki , Kanagawa 214-8571 , Japan.

Shingo Hirose (S)

Department of Applied Chemistry, School of Science and Technology , Meiji University , 1-1-1 Higashimita , Tama-ku, Kawasaki , Kanagawa 214-8571 , Japan.

Anton Brown (A)

Division of Molecular Imaging and Photonics, Department of Chemistry , KU Leuven , Celestijnenlaan 200F , Leuven 3001 , Belgium.

Brandon Hirsch (B)

Division of Molecular Imaging and Photonics, Department of Chemistry , KU Leuven , Celestijnenlaan 200F , Leuven 3001 , Belgium.

Lakshya Daukiya (L)

Division of Molecular Imaging and Photonics, Department of Chemistry , KU Leuven , Celestijnenlaan 200F , Leuven 3001 , Belgium.

Steven De Feyter (S)

Division of Molecular Imaging and Photonics, Department of Chemistry , KU Leuven , Celestijnenlaan 200F , Leuven 3001 , Belgium.

Yoshito Tobe (Y)

Division of Frontier Materials Science, Graduate School of Engineering Science , Osaka University , Toyonaka , Osaka 560-8531 , Japan.
The Institute of Scientific and Industrial Research , Osaka University , Ibaraki , Osaka 567-0047 , Japan.

Classifications MeSH