Artificial Neuron using Vertical MoS


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
10 01 2019
Historique:
received: 11 06 2018
accepted: 06 11 2018
entrez: 12 1 2019
pubmed: 12 1 2019
medline: 12 1 2019
Statut: epublish

Résumé

With the ever-increasing demand for low power electronics, neuromorphic computing has garnered huge interest in recent times. Implementing neuromorphic computing in hardware will be a severe boost for applications involving complex processes such as image processing and pattern recognition. Artificial neurons form a critical part in neuromorphic circuits, and have been realized with complex complementary metal-oxide-semiconductor (CMOS) circuitry in the past. Recently, metal-insulator-transition materials have been used to realize artificial neurons. Although memristors have been implemented to realize synaptic behavior, not much work has been reported regarding the neuronal response achieved with these devices. In this work, we use the volatile threshold switching behavior of a vertical-MoS

Identifiants

pubmed: 30631087
doi: 10.1038/s41598-018-35828-z
pii: 10.1038/s41598-018-35828-z
pmc: PMC6328611
doi:

Types de publication

Journal Article Research Support, Non-U.S. Gov't

Langues

eng

Sous-ensembles de citation

IM

Pagination

53

Subventions

Organisme : University of Central Florida (UCF)
ID : 20080746
Pays : International

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Auteurs

Hirokjyoti Kalita (H)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida, 32816, USA.

Adithi Krishnaprasad (A)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida, 32816, USA.

Nitin Choudhary (N)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.

Sonali Das (S)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.

Durjoy Dev (D)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida, 32816, USA.

Yi Ding (Y)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.
Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida, 32816, USA.

Laurene Tetard (L)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.
Department of Physics, University of Central Florida, Orlando, Florida, 32816, USA.

Hee-Suk Chung (HS)

Analytical Research Division, Korea Basic Science Institute, Jeonju, jeollabuk-do, 54907, South Korea.

Yeonwoong Jung (Y)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida, 32816, USA.
Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida, 32816, USA.

Tania Roy (T)

NanoScience Technology Center, University of Central Florida, Orlando, Florida, 32826, USA. tania.roy@ucf.edu.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida, 32816, USA. tania.roy@ucf.edu.
Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida, 32816, USA. tania.roy@ucf.edu.

Classifications MeSH