Copper Nanowire Dispersion through an Electrostatic Dispersion Mechanism for High-Performance Flexible Transparent Conducting Films and Optoelectronic Devices.

copper nanowires electrostatic dispersion mechanism flexible optoelectronic devices post-treatment temperatures transparent conducting films

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
06 Feb 2019
Historique:
pubmed: 16 1 2019
medline: 16 1 2019
entrez: 16 1 2019
Statut: ppublish

Résumé

Highly dispersed copper nanowire (CuNW) is an essential prerequisite for its practical application in various electronic devices. At present, the dispersion of CuNW is almost realized through the steric hindrance effect of polymers. However, the high post-treatment temperature of polymers makes this dispersion mechanism impractical for many actual applications. Here, after investigating the relationship between the electrostatic dispersion force and influence factors, an electrostatic dispersion mechanism is refined by us. Under the guidance of this mechanism, high dispersion of CuNW and a record low post-treatment temperature (80 °C) are realized simultaneously. The high dispersity endows CuNW with good stability (-45.66 mV) in water-based ink, high uniformity (65.7 ± 2.5 Ω sq

Identifiants

pubmed: 30644720
doi: 10.1021/acsami.8b19277
doi:

Types de publication

Journal Article

Langues

eng

Pagination

5264-5275

Auteurs

Zhongmin Yin (Z)

State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering , University of Electronic Science and Technology of China (UESTC) , Chengdu 610054 , P. R. China.
Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Shanyong Chen (S)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Youwei Guan (Y)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Qinqin Ran (Q)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Qingsong Zhang (Q)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Xingwu Yan (X)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Rong Jin (R)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Hong Yu (H)

Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Lu Li (L)

State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering , University of Electronic Science and Technology of China (UESTC) , Chengdu 610054 , P. R. China.
Research Institute for New Materials Technology , Chongqing University of Arts and Sciences , Yongchuan 402160 , P. R. China.

Junsheng Yu (J)

State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering , University of Electronic Science and Technology of China (UESTC) , Chengdu 610054 , P. R. China.

Classifications MeSH