The ultra-photostable and electrically modulated Stimulated Emission in perylene-based dye doped liquid crystal.


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
14 Feb 2019
Historique:
received: 11 06 2018
accepted: 17 12 2018
entrez: 16 2 2019
pubmed: 16 2 2019
medline: 16 2 2019
Statut: epublish

Résumé

One of the most important drawback of organic dyes is their low photo-stability which reduces possibility of their commercial utilization. In this article we employ the strategy of dye re-crystallization from oversaturated matrix in order to enhance material's durability. One of the main advantages of perylene derivative is ability to form emissive j-aggregates, good miscibility and incorporation into liquid crystalline matrix. Investigation of perylene-based dye and LC matrix brought as the result very efficient light amplification modulation by applied external electric field. In our article we show that Stimulated Emission (STE) is possible to achieve from perylene-derivative based system, at typical fluence thresholds for laser dyes: 3.9 mJ/cm

Identifiants

pubmed: 30765751
doi: 10.1038/s41598-019-38484-z
pii: 10.1038/s41598-019-38484-z
pmc: PMC6376009
doi:

Types de publication

Journal Article

Langues

eng

Pagination

2143

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Auteurs

A Adamow (A)

The Advanced Materials Engineering and Modelling Group, Wroclaw University of Science and Technology, Wybrzeze Stanislawa Wyspianskiego 27, 50-370, Wroclaw, Poland.

L Sznitko (L)

The Advanced Materials Engineering and Modelling Group, Wroclaw University of Science and Technology, Wybrzeze Stanislawa Wyspianskiego 27, 50-370, Wroclaw, Poland.

E Chrzumnicka (E)

Institute for Materials Research and Quantum Engineering, Faculty of Technical Physic, Poznan University of Technology, Piotrowo 3, 60-965, Poznan, Poland.

J Stachera (J)

Institute for Materials Research and Quantum Engineering, Faculty of Technical Physic, Poznan University of Technology, Piotrowo 3, 60-965, Poznan, Poland.

A Szukalski (A)

The Advanced Materials Engineering and Modelling Group, Wroclaw University of Science and Technology, Wybrzeze Stanislawa Wyspianskiego 27, 50-370, Wroclaw, Poland.

T Martynski (T)

Institute for Materials Research and Quantum Engineering, Faculty of Technical Physic, Poznan University of Technology, Piotrowo 3, 60-965, Poznan, Poland.

J Mysliwiec (J)

The Advanced Materials Engineering and Modelling Group, Wroclaw University of Science and Technology, Wybrzeze Stanislawa Wyspianskiego 27, 50-370, Wroclaw, Poland. jaroslaw.mysliwiec@pwr.edu.pl.

Classifications MeSH