Reversible defect engineering in graphene grain boundaries.


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
06 03 2019
Historique:
received: 27 05 2018
accepted: 04 02 2019
entrez: 8 3 2019
pubmed: 8 3 2019
medline: 8 3 2019
Statut: epublish

Résumé

Research efforts in large area graphene synthesis have been focused on increasing grain size. Here, it is shown that, beyond 1 μm grain size, grain boundary engineering determines the electronic properties of the monolayer. It is established by chemical vapor deposition experiments and first-principle calculations that there is a thermodynamic correlation between the vapor phase chemistry and carbon potential at grain boundaries and triple junctions. As a result, boundary formation can be controlled, and well-formed boundaries can be intentionally made defective, reversibly. In 100 µm long channels this aspect is demonstrated by reversibly changing room temperature electronic mobilities from 1000 to 20,000 cm

Identifiants

pubmed: 30842414
doi: 10.1038/s41467-019-09000-8
pii: 10.1038/s41467-019-09000-8
pmc: PMC6403358
doi:

Types de publication

Journal Article Research Support, Non-U.S. Gov't

Langues

eng

Pagination

1090

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Auteurs

Krishna Balasubramanian (K)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India.
Electrical Engineering, Technion Israel Institute of Technology, Haifa, 3200003, Israel.

Tathagatha Biswas (T)

Physics Department, Indian Institute of Science, Bangalore, 560012, India.

Priyadarshini Ghosh (P)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India.
Materials Research Center, Indian Institute of Science, Bangalore, 560012, India.
Materials Engineering, Technion Israel Institute of Technology, Haifa, 3200003, Israel.

Swathi Suran (S)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India.

Abhishek Mishra (A)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India.

Rohan Mishra (R)

Department of Mechanical Engineering and Materials Science, Washington University in St. Louis, Washington, MO, 63130, USA.

Ritesh Sachan (R)

Material Science and Technology division, Oak Ridge National Laboratory, Tennessee, 37831, USA.
School of Mechanical and Aerospace Engineering, Oklahoma State University, Stillwater, 74078, OK, USA.

Manish Jain (M)

Physics Department, Indian Institute of Science, Bangalore, 560012, India.

Manoj Varma (M)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India.

Rudra Pratap (R)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India.

Srinivasan Raghavan (S)

Center for Nanoscience and Engineering, Indian Institute of Science, Bangalore, 560012, India. sraghavan@iisc.ac.in.

Classifications MeSH