Room Temperature Resonant Photocurrent in an Erbium Low-Doped Silicon Transistor at Telecom Wavelength.
erbium
photocurrent
silicon transistor
Journal
Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216
Informations de publication
Date de publication:
11 Mar 2019
11 Mar 2019
Historique:
received:
01
02
2019
revised:
01
03
2019
accepted:
05
03
2019
entrez:
14
3
2019
pubmed:
14
3
2019
medline:
14
3
2019
Statut:
epublish
Résumé
An erbium-doped silicon transistor prepared by ion implantation and co-doped with oxygen is investigated by photocurrent generation in the telecommunication range. The photocurrent is explored at room temperature as a function of the wavelength by using a supercontinuum laser source working in the μW range. The 1-μm² transistor is tuned to involve in the transport only those electrons lying in the Er-O states. The spectrally resolved photocurrent is characterized by the typical absorption line of erbium and the linear dependence of the signal over the impinging power demonstrates that the Er-doped transistor is operating far from saturation. The relatively small number of estimated photoexcited atoms (≈ 4 × 10 4 ) makes Er-dpoed silicon potentially suitable for designing resonance-based frequency selective single photon detectors at 1550 nm.
Identifiants
pubmed: 30862111
pii: nano9030416
doi: 10.3390/nano9030416
pmc: PMC6474141
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : Ministry of Education, Culture, Sports, Science and Technology
ID : Grant-in-Aid for Basic Research (B) and Young Scientists (A)
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