Room Temperature Resonant Photocurrent in an Erbium Low-Doped Silicon Transistor at Telecom Wavelength.

erbium photocurrent silicon transistor

Journal

Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216

Informations de publication

Date de publication:
11 Mar 2019
Historique:
received: 01 02 2019
revised: 01 03 2019
accepted: 05 03 2019
entrez: 14 3 2019
pubmed: 14 3 2019
medline: 14 3 2019
Statut: epublish

Résumé

An erbium-doped silicon transistor prepared by ion implantation and co-doped with oxygen is investigated by photocurrent generation in the telecommunication range. The photocurrent is explored at room temperature as a function of the wavelength by using a supercontinuum laser source working in the μW range. The 1-μm² transistor is tuned to involve in the transport only those electrons lying in the Er-O states. The spectrally resolved photocurrent is characterized by the typical absorption line of erbium and the linear dependence of the signal over the impinging power demonstrates that the Er-doped transistor is operating far from saturation. The relatively small number of estimated photoexcited atoms (≈ 4 × 10 4 ) makes Er-dpoed silicon potentially suitable for designing resonance-based frequency selective single photon detectors at 1550 nm.

Identifiants

pubmed: 30862111
pii: nano9030416
doi: 10.3390/nano9030416
pmc: PMC6474141
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Ministry of Education, Culture, Sports, Science and Technology
ID : Grant-in-Aid for Basic Research (B) and Young Scientists (A)

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Auteurs

Michele Celebrano (M)

Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, I-20133 Milano, Italy. michele.celebrano@polimi.it.

Lavinia Ghirardini (L)

Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, I-20133 Milano, Italy. lavinia.ghirardini@polimi.it.

Marco Finazzi (M)

Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, I-20133 Milano, Italy. marco.finazzi@polimi.it.

Giorgio Ferrari (G)

Dipartimento di Elettronica, Informazione e Bioingegneria, Politecnico di Milano, Via Colombo 81, I-20133 Milano, Italy. giorgio.ferrari@polimi.it.

Yuki Chiba (Y)

School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan. chiba@tanii.nano.waseda.ac.jp.

Ayman Abdelghafar (A)

School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan. aymanabdelghafar@toki.waseda.jp.

Maasa Yano (M)

School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan. m.ntr0504@ruri.waseda.jp.

Takahiro Shinada (T)

Center for Innovative Integrated Electronic Systems, Tohoku University, Sendai 980-8572, Japan. shinada@cies.tohoku.ac.jp.

Takashi Tanii (T)

School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan. tanii@waseda.jp.

Enrico Prati (E)

Istituto di Fotonica e Nanotecnologie, Consiglio Nazionale delle Ricerche, Piazza Leonardo da Vinci 32, I-20133 Milano, Italy. enrico.prati@cnr.it.

Classifications MeSH