Electrical Polarization in AlN/GaN Nanodisks Measured by Momentum-Resolved 4D Scanning Transmission Electron Microscopy.


Journal

Physical review letters
ISSN: 1079-7114
Titre abrégé: Phys Rev Lett
Pays: United States
ID NLM: 0401141

Informations de publication

Date de publication:
15 Mar 2019
Historique:
received: 13 11 2018
entrez: 2 4 2019
pubmed: 2 4 2019
medline: 2 4 2019
Statut: ppublish

Résumé

We report the mapping of polarization-induced internal electric fields in AlN/GaN nanowire heterostructures at unit cell resolution as a key for the correlation of optical and structural phenomena in semiconductor optoelectronics. Momentum-resolved aberration-corrected scanning transmission electron microscopy is employed as a new imaging mode that simultaneously provides four-dimensional data in real and reciprocal space. We demonstrate how internal mesoscale and atomic electric fields can be separated in an experiment, which is verified by comprehensive dynamical simulations of multiple electron scattering. A mean difference of 5.3±1.5  MV/cm is found for the polarization-induced electric fields in AlN and GaN, being in accordance with dedicated simulations and photoluminescence measurements in previous publications.

Identifiants

pubmed: 30932647
doi: 10.1103/PhysRevLett.122.106102
doi:

Types de publication

Journal Article

Langues

eng

Pagination

106102

Auteurs

Knut Müller-Caspary (K)

Ernst-Ruska-Centre for Microscopy and Spectroscopy with Electrons, Forschungszentrum Jülich, 52425 Jülich, Germany.
EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium.

Tim Grieb (T)

IFP, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.
MAPEX Center for Materials and Processes, University of Bremen, Bibliothekstraße 1, 28359 Bremen, Germany.

Jan Müßener (J)

IFP, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.

Nicolas Gauquelin (N)

EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium.

Pascal Hille (P)

IFP, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.

Jörg Schörmann (J)

I. Physikalisches Institut, Justus-Liebig University Gießen, Heinrich-Buff-Ring 16, 35392 Gießen, Germany.

Johan Verbeeck (J)

EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium.

Sandra Van Aert (S)

EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium.

Martin Eickhoff (M)

IFP, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.

Andreas Rosenauer (A)

IFP, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.
MAPEX Center for Materials and Processes, University of Bremen, Bibliothekstraße 1, 28359 Bremen, Germany.

Classifications MeSH