Electron beam broadening in electron-transparent samples at low electron energies.

Electron beam broadening LVSTEM Low-energy STEM STEM-in-SEM Scanning transmission electron microscopy TSEM

Journal

Journal of microscopy
ISSN: 1365-2818
Titre abrégé: J Microsc
Pays: England
ID NLM: 0204522

Informations de publication

Date de publication:
Jun 2019
Historique:
received: 21 01 2019
revised: 08 04 2019
accepted: 10 04 2019
pubmed: 20 4 2019
medline: 20 4 2019
entrez: 20 4 2019
Statut: ppublish

Résumé

Scanning transmission electron microscopy (STEM) at low primary electron energies has received increasing attention in recent years because knock-on damage can be avoided and high contrast for weakly scattering materials is obtained. However, the broadening of the electron beam in the sample is pronounced at low electron energies, which degrades resolution and limits the maximum specimen thickness. In this work, we have studied electron beam broadening in materials with atomic numbers Z between 10 and 32 (MgO, Si, SrTiO

Identifiants

pubmed: 31001840
doi: 10.1111/jmi.12793
doi:

Types de publication

Journal Article

Langues

eng

Pagination

150-157

Subventions

Organisme : Deutsche Forschungsgemeinschaft
ID : Ge 841/20-2

Informations de copyright

© 2019 The Authors Journal of Microscopy © 2019 Royal Microscopical Society.

Auteurs

M Hugenschmidt (M)

Laboratory for Electron Microscopy (LEM), Karlsruhe Institute of Technology (KIT), Engesserstr. 7, 76131, Karlsruhe, Baden-Württemberg, Germany.

E Müller (E)

Laboratory for Electron Microscopy (LEM), Karlsruhe Institute of Technology (KIT), Engesserstr. 7, 76131, Karlsruhe, Baden-Württemberg, Germany.

D Gerthsen (D)

Laboratory for Electron Microscopy (LEM), Karlsruhe Institute of Technology (KIT), Engesserstr. 7, 76131, Karlsruhe, Baden-Württemberg, Germany.

Classifications MeSH