Effect of semiconductor surface homogeneity and interface quality on electrical performance of inkjet-printed oxide field-effect transistors.


Journal

Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272

Informations de publication

Date de publication:
25 Oct 2019
Historique:
pubmed: 19 6 2019
medline: 19 6 2019
entrez: 19 6 2019
Statut: ppublish

Résumé

In semiconductor technology, the crystallite size of semiconductors is often directly correlated with their superior intrinsic and device mobility. However, when solution-processed, large crystals may bring in higher surface roughness and layer inhomogeneity, which can deteriorate the interface quality and device performance. Along this line, a thorough study on printed oxide field-effect transistors (FETs) has been performed, where the relative significance of crystallite size, surface roughness and spatial homogeneity are evaluated. The comprehensive investigations suggest the spatial homogeneity to be more important than crystallite size in solution processed/printed devices. It is demonstrated that the addition of a small amount of high boiling point polyol in the precursor ink can create large nucleation sites, resulting in reduced average crystallite size, superior inter-particle neck formation, and high spatial homogeneity. Interestingly, carefully estimated device mobility of these polyol-derived In

Identifiants

pubmed: 31212271
doi: 10.1088/1361-6528/ab2a84
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

435201

Auteurs

Sandeep K Mondal (SK)

Department of Materials Engineering, Indian Institute of Science (IISc), Bangalore, 560012, India.

Classifications MeSH