Chemical Vapor Deposition of Organic-Inorganic Bismuth-Based Perovskite Films for Solar Cell Application.


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
05 Jul 2019
Historique:
received: 21 03 2019
accepted: 17 06 2019
entrez: 7 7 2019
pubmed: 7 7 2019
medline: 7 7 2019
Statut: epublish

Résumé

Perovskite solar cells have shown a rapid increase of performance and overcome the threshold of 20% power conversion efficiency (PCE). The main issues hampering commercialization are the lack of deposition methods for large areas, missing long-term device stability and the toxicity of the commonly used Pb-based compounds. In this work, we present a novel chemical vapor deposition (CVD) process for Pb-free air-stable methylammonium bismuth iodide (MBI) layers, which enables large-area production employing close-coupled showerhead technology. We demonstrate the influence of precursor rates on the layer morphology as well as on the optical and crystallographic properties. The impact of substrate temperature and layer thickness on the morphology of MBI crystallites is discussed. We obtain smooth layers with lateral crystallite sizes up to 500 nm. Moreover, the application of CVD-processed MBI layers in non-inverted perovskite solar cells is presented.

Identifiants

pubmed: 31278317
doi: 10.1038/s41598-019-46199-4
pii: 10.1038/s41598-019-46199-4
pmc: PMC6611780
doi:

Types de publication

Journal Article

Langues

eng

Pagination

9774

Subventions

Organisme : EC | European Regional Development Fund (Europski Fond za Regionalni Razvoj)
ID : EFRE-0800127
Organisme : EC | European Regional Development Fund (Europski Fond za Regionalni Razvoj)
ID : EFRE-0801060

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Auteurs

S Sanders (S)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany. sanders@cst.rwth-aachen.de.

D Stümmler (D)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.

P Pfeiffer (P)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.

N Ackermann (N)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.

G Simkus (G)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.
AIXTRON SE, Dornkaulstr. 2, 52134, Herzogenrath, Germany.

M Heuken (M)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.
AIXTRON SE, Dornkaulstr. 2, 52134, Herzogenrath, Germany.

P K Baumann (PK)

APEVA SE, Dornkaulstr. 2, 52134, Herzogenrath, Germany.

A Vescan (A)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.

H Kalisch (H)

Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074, Aachen, Germany.

Classifications MeSH