Use of Selective Redox Cross-Inhibitors for the Control of Organic Layer Formation Obtained via Diazonium Salt Reduction.


Journal

Langmuir : the ACS journal of surfaces and colloids
ISSN: 1520-5827
Titre abrégé: Langmuir
Pays: United States
ID NLM: 9882736

Informations de publication

Date de publication:
27 Aug 2019
Historique:
pubmed: 13 7 2019
medline: 13 7 2019
entrez: 13 7 2019
Statut: ppublish

Résumé

The controlled electrochemical deposition of a series of four diazonium salts (4-bromobenzene, 4-iodobenzene, 4-methoxybenzene, and 4-diethylaminobenzene diazonium) on carbon surfaces has been achieved by exploiting the use of three redox mediators: 2,2-diphenyl-1-picrylhydrazyl, chloranil, and dichlone. The efficiency of the method rests on a fast redox cross-reaction in the diffusion layer between the diazonium compound and the reduced form of the selected inhibitor, characterized by an outer-sphere electron transfer. The effect of the inhibitor addition in the deposition solution was characterized using electrochemical techniques, X-ray photoelectron spectroscopy, and atomic force microscopy. Near-monolayers are obtained when the potential of the redox mediator is at least 100 mV lower than the reduction potential of the diazonium salt concerned. A judicious choice of the redox entity can allow, via a fine control of the experimental conditions, to modulate the thickness of organic layers by varying the grafting potential.

Identifiants

pubmed: 31299159
doi: 10.1021/acs.langmuir.9b01397
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

11048-11055

Auteurs

Isidoro López (I)

MOLTECH Anjou-UMR CNRS 6200, Université; d'Angers, SFR MATRIX , 2 Bd Lavoisier , 49045 Angers Cedex , France.

Sylvie Dabos-Seignon (S)

MOLTECH Anjou-UMR CNRS 6200, Université; d'Angers, SFR MATRIX , 2 Bd Lavoisier , 49045 Angers Cedex , France.

Tony Breton (T)

MOLTECH Anjou-UMR CNRS 6200, Université; d'Angers, SFR MATRIX , 2 Bd Lavoisier , 49045 Angers Cedex , France.

Classifications MeSH