Focused Electron Beam-Induced Deposition and Post-Growth Purification Using the Heteroleptic Ru Complex (η
focused electron beam induced deposition
mask repair
post-growth purification
precursor compounds
ruthenium
Journal
ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991
Informations de publication
Date de publication:
07 Aug 2019
07 Aug 2019
Historique:
pubmed:
17
7
2019
medline:
17
7
2019
entrez:
17
7
2019
Statut:
ppublish
Résumé
Focused electron beam-induced deposition using the heteroleptic complex (η
Identifiants
pubmed: 31310091
doi: 10.1021/acsami.9b07634
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM