Focused Electron Beam-Induced Deposition and Post-Growth Purification Using the Heteroleptic Ru Complex (η

focused electron beam induced deposition mask repair post-growth purification precursor compounds ruthenium

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
07 Aug 2019
Historique:
pubmed: 17 7 2019
medline: 17 7 2019
entrez: 17 7 2019
Statut: ppublish

Résumé

Focused electron beam-induced deposition using the heteroleptic complex (η

Identifiants

pubmed: 31310091
doi: 10.1021/acsami.9b07634
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

28164-28171

Auteurs

Jakub Jurczyk (J)

Laboratory for Mechanics of Materials and Nanostructures , Empa-Swiss Federal Laboratories for Materials Science and Technology , Feuerwerkerstrasse 39 , CH-3602 Thun , Switzerland.
Faculty of Physics and Applied Computer Science , AGH University of Science and Technology Krakow , Al. Mickiewicza 30 , 30-059 Kraków , Poland.

Christopher R Brewer (CR)

Department of Chemistry , University of Florida , 32611-7200 Gainesville , Florida , United States.

Olivia M Hawkins (OM)

Department of Chemistry , University of Florida , 32611-7200 Gainesville , Florida , United States.

Mikhail N Polyakov (MN)

Laboratory for Mechanics of Materials and Nanostructures , Empa-Swiss Federal Laboratories for Materials Science and Technology , Feuerwerkerstrasse 39 , CH-3602 Thun , Switzerland.

Czeslaw Kapusta (C)

Faculty of Physics and Applied Computer Science , AGH University of Science and Technology Krakow , Al. Mickiewicza 30 , 30-059 Kraków , Poland.

Lisa McElwee-White (L)

Department of Chemistry , University of Florida , 32611-7200 Gainesville , Florida , United States.

Ivo Utke (I)

Laboratory for Mechanics of Materials and Nanostructures , Empa-Swiss Federal Laboratories for Materials Science and Technology , Feuerwerkerstrasse 39 , CH-3602 Thun , Switzerland.

Classifications MeSH