Interplay of Atomic Interactions in the Intermetallic Semiconductor Be

beryllium chemical bonding intermetallic compounds platinum semiconductors

Journal

Angewandte Chemie (International ed. in English)
ISSN: 1521-3773
Titre abrégé: Angew Chem Int Ed Engl
Pays: Germany
ID NLM: 0370543

Informations de publication

Date de publication:
28 Oct 2019
Historique:
received: 05 08 2019
revised: 04 09 2019
pubmed: 5 9 2019
medline: 5 9 2019
entrez: 5 9 2019
Statut: ppublish

Résumé

Semiconducting substances form one of the most important families of functional materials. However, semiconductors containing only metals are very rare. The chemical mechanisms behind their ground-state properties are only partially understood. Our investigations have rather unexpectedly revealed the semiconducting behaviour (band gap of 190 meV) for the intermetallic compound Be

Identifiants

pubmed: 31483920
doi: 10.1002/anie.201909782
pmc: PMC7754163
doi:

Types de publication

Journal Article Review

Langues

eng

Sous-ensembles de citation

IM

Pagination

15928-15933

Informations de copyright

© 2019 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

Références

Acc Chem Res. 2018 Feb 20;51(2):214-222
pubmed: 29313671
Phys Rev Lett. 2017 Jun 9;118(23):236401
pubmed: 28644655
Inorg Chem. 2004 Oct 4;43(20):6159-67
pubmed: 15446860
Acc Chem Res. 2018 Jan 16;51(1):49-58
pubmed: 29251496
Phys Rev B Condens Matter. 1989 Sep 15;40(8):5319-5324
pubmed: 9992559
Phys Rev Lett. 1996 Mar 4;76(10):1735-1738
pubmed: 10060504
Annu Rev Phys Chem. 2012;63:45-64
pubmed: 22404585
Science. 2016 Mar 4;351(6277):1061-4
pubmed: 26912359
Nat Mater. 2018 May;17(5):421-426
pubmed: 29632407
Chemistry. 2007;13(20):5724-41
pubmed: 17458839
Chem Soc Rev. 2008 Sep;37(9):1826-35
pubmed: 18762832
Nature. 2011 Nov 16;479(7373):309
pubmed: 22094689
Faraday Discuss. 2007;135:43-54; discussion 125-49, 503-6
pubmed: 17328423
Angew Chem Int Ed Engl. 2017 Jan 24;56(5):1313-1318
pubmed: 28004464
Inorg Chem. 2018 Oct 15;57(20):12908-12919
pubmed: 30281292
Sci Technol Adv Mater. 2014 Jun 11;15(3):034803
pubmed: 27877674
Dalton Trans. 2016 Feb 28;45(8):3236-43
pubmed: 26693805
Angew Chem Int Ed Engl. 2019 Oct 28;58(44):15928-15933
pubmed: 31483920

Auteurs

Alfred Amon (A)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Eteri Svanidze (E)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Alim Ormeci (A)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Marcus König (M)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Deepa Kasinathan (D)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Daisuke Takegami (D)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Yurii Prots (Y)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Yen-Fa Liao (YF)

National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, 30076, Hsinchu, Taiwan.

Ku-Ding Tsuei (KD)

National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, 30076, Hsinchu, Taiwan.

Liu Hao Tjeng (LH)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Andreas Leithe-Jasper (A)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Yuri Grin (Y)

Department Chemische Metallkunde, Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Str. 40, 01277, Dresden, Germany.

Classifications MeSH