High x-ray resolving power utilizing asymmetric diffraction from a quartz transmission crystal measured in the 6 keV to 22 keV energy range.
Journal
Applied optics
ISSN: 1539-4522
Titre abrégé: Appl Opt
Pays: United States
ID NLM: 0247660
Informations de publication
Date de publication:
01 Jul 2019
01 Jul 2019
Historique:
entrez:
11
9
2019
pubmed:
11
9
2019
medline:
11
9
2019
Statut:
ppublish
Résumé
A Cauchois-type spectrometer utilizing the (203) lattice planes at an oblique angle of 11.53° to the normal to the surface of a quartz transmission crystal recorded the Kα and Kβ spectral lines of six elements from Fe to Ag in the 6-22 keV energy range from a laboratory x-ray source. After deconvolving the natural lifetime widths and the image plate detector broadening from the observed spectral linewidths, the intrinsic crystal resolving power was determined to be 4000 at the lower energies and decreasing to 1000 at the higher energies. Previously, a Si wafer crystal exhibited twice this resolving power when the (331) planes had been used in asymmetric geometry. The investigation of diffraction with this quartz crystal, with a very similar lattice spacing and therefore spectral coverage, was motivated by the larger integrated reflectivity of quartz due to its well-known quasimosaicity upon elastic bending. The measured spectral linewidths were in good agreement with the widths calculated by accounting for various broadening mechanisms, including source size, crystal thickness, crystal height, crystal rocking curve width, geometrical aberrations, and possible spectrometer configuration errors. This is the first, to the best of our knowledge, demonstration of high resolving power achieved by asymmetric diffraction over a wide energy range (6-22 keV) and with detailed comparisons with theoretical broadenings. Based on these results, Cauchois spectrometers employing asymmetric planes of perfect quartz and silicon crystals can be reliably designed and optimized for high-resolution spectroscopy in the >6 keV energy range.
Identifiants
pubmed: 31503618
pii: 414784
doi: 10.1364/AO.58.005225
pmc: PMC7274499
mid: NIHMS1572937
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
5225-5232Subventions
Organisme : Intramural NIST DOC
ID : 9999-NIST
Pays : United States
Références
Rev Sci Instrum. 2016 May;87(5):053101
pubmed: 27250386
J Res Natl Inst Stand Technol. 2004 Feb 01;109(1):75-98
pubmed: 27366598
Appl Opt. 2008 May 20;47(15):2767-78
pubmed: 18493282
Rev Sci Instrum. 2017 Oct;88(10):103107
pubmed: 29092530
Opt Lett. 2011 Apr 15;36(8):1335-7
pubmed: 21499348
Rev Sci Instrum. 2016 Nov;87(11):11D502
pubmed: 27910652