High performance of 3D silicon nanowires array@CrN for electrochemical capacitors.
Journal
Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272
Informations de publication
Date de publication:
17 Jan 2020
17 Jan 2020
Historique:
pubmed:
1
10
2019
medline:
1
10
2019
entrez:
1
10
2019
Statut:
ppublish
Résumé
Silicon nanowire (SiNW) arrays were coated with chromium nitride (CrN) for use as supercapacitor electrodes. The CrN layer of different thicknesses was deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H
Identifiants
pubmed: 31569088
doi: 10.1088/1361-6528/ab4963
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM