Velocity controlled pattern writing: An application of stochastic resonance.


Journal

Chaos (Woodbury, N.Y.)
ISSN: 1089-7682
Titre abrégé: Chaos
Pays: United States
ID NLM: 100971574

Informations de publication

Date de publication:
Sep 2019
Historique:
entrez: 3 10 2019
pubmed: 3 10 2019
medline: 3 10 2019
Statut: ppublish

Résumé

In the present work, the concept of stochastic resonance is employed for pattern fabrication. In particular, the interplay of noise amplitudes and intrinsic system time scales is investigated. This interplay enabled us to obtain preordained patterns. Experiments were performed galvanostatically in a two electrode electrochemical cell onto a n-type Si substrate using a coherent wavelength laser source of 5 mW intensity. A focused laser beam was swept along the silicon substrate unidirectionally by moving the electrochemical cell at different velocities. By systematic tuning of the velocity, we have observed a unimodal variation in the contrast of the pattern. This indicates the occurrence of the stochastic resonance phenomena. Corresponding numerical simulations, performed on a spatial array of diffusively coupled FitzHugh-Nagumo oscillators in the presence of external noise, reveal good agreement with the experimental observations.

Identifiants

pubmed: 31575117
doi: 10.1063/1.5097781
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

093121

Auteurs

Tanushree Roy (T)

Centre for Research in Nanotechnology and Science, IIT Bombay, Mumbai 400076, Maharashtra, India.

P Parmananda (P)

Department of Physics, IIT Bombay, Mumbai 400076, Maharashtra, India.

Classifications MeSH