Metasurface-generated complex 3-dimensional optical fields for interference lithography.
3D printing
beam shaping
interference lithography
metasurface
nanophotonics
Journal
Proceedings of the National Academy of Sciences of the United States of America
ISSN: 1091-6490
Titre abrégé: Proc Natl Acad Sci U S A
Pays: United States
ID NLM: 7505876
Informations de publication
Date de publication:
22 10 2019
22 10 2019
Historique:
pubmed:
9
10
2019
medline:
9
10
2019
entrez:
9
10
2019
Statut:
ppublish
Résumé
Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask-assisted 3D nanofabrication which provides great freedom in patterning various periodic structures. To showcase the versatility of this platform, we design metasurface masks that generate exotic periodic lattices like gyroid, rotated cubic, and diamond structures. As a proof of concept, we experimentally demonstrate a diffractive element that can generate the diamond lattice.
Identifiants
pubmed: 31591229
pii: 1908382116
doi: 10.1073/pnas.1908382116
pmc: PMC6815187
doi:
Types de publication
Journal Article
Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.
Langues
eng
Sous-ensembles de citation
IM
Pagination
21379-21384Informations de copyright
Copyright © 2019 the Author(s). Published by PNAS.
Déclaration de conflit d'intérêts
Competing interest statement: S.M.K., E.A, and A.F. are inventors of US patent application US20190173191A1 that covers the use of metasurface masks for 3D beam shaping. The authors declare no other competing interests.
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