Interfacial Characterization of Dentin Conditioned with Chitosan Hydroxyapatite Precursor Nanocomplexes Using Time-of-flight Secondary Ion Mass Spectrometry.
Chitosan
dentin conditioning
interface
nanocomplexes
sealer-dentin interface
Journal
Journal of endodontics
ISSN: 1878-3554
Titre abrégé: J Endod
Pays: United States
ID NLM: 7511484
Informations de publication
Date de publication:
Dec 2019
Dec 2019
Historique:
received:
02
01
2019
revised:
13
08
2019
accepted:
24
08
2019
pubmed:
9
10
2019
medline:
14
1
2020
entrez:
10
10
2019
Statut:
ppublish
Résumé
The purpose of this study was to evaluate the effect of chitosan-hydroxyapatite precursor (C-HA) nanocomplex conditioning on the chemical modifications at the tricalcium silicate sealer-dentin interface using time-of-flight secondary ion mass spectrometry. Dentin slabs from human premolar root dentin were prepared, demineralized, and randomly distributed between control and C-HA nanocomplex conditioned groups. Tricalcium silicate sealer was applied, and the slabs were allowed to set in 100% humidity for 10 days. The cross-sectional area was exposed, and the sealer-dentin interface was characterized for chemical/ultrastructural evaluation with time-of-flight secondary ion mass spectrometry and transmission electron microscopy, respectively. Chemical analysis revealed the presence of an ion-rich layer constituted of abundant phosphates (PO C-HA nanocomplex conditioning of dentin before tricalcium silicate sealer application resulted in a chemically modified dentin substrate with an ion-rich layer consisting of phosphate, calcium, calcium phosphates, and chitosan that chemically modified the dentin surface/subsurface.
Identifiants
pubmed: 31594670
pii: S0099-2399(19)30625-9
doi: 10.1016/j.joen.2019.08.011
pii:
doi:
Substances chimiques
Calcium Compounds
0
Root Canal Filling Materials
0
Silicates
0
Chitosan
9012-76-4
Durapatite
91D9GV0Z28
Types de publication
Journal Article
Langues
eng
Pagination
1513-1521Informations de copyright
Copyright © 2019 American Association of Endodontists. Published by Elsevier Inc. All rights reserved.