Interfacial Characterization of Dentin Conditioned with Chitosan Hydroxyapatite Precursor Nanocomplexes Using Time-of-flight Secondary Ion Mass Spectrometry.


Journal

Journal of endodontics
ISSN: 1878-3554
Titre abrégé: J Endod
Pays: United States
ID NLM: 7511484

Informations de publication

Date de publication:
Dec 2019
Historique:
received: 02 01 2019
revised: 13 08 2019
accepted: 24 08 2019
pubmed: 9 10 2019
medline: 14 1 2020
entrez: 10 10 2019
Statut: ppublish

Résumé

The purpose of this study was to evaluate the effect of chitosan-hydroxyapatite precursor (C-HA) nanocomplex conditioning on the chemical modifications at the tricalcium silicate sealer-dentin interface using time-of-flight secondary ion mass spectrometry. Dentin slabs from human premolar root dentin were prepared, demineralized, and randomly distributed between control and C-HA nanocomplex conditioned groups. Tricalcium silicate sealer was applied, and the slabs were allowed to set in 100% humidity for 10 days. The cross-sectional area was exposed, and the sealer-dentin interface was characterized for chemical/ultrastructural evaluation with time-of-flight secondary ion mass spectrometry and transmission electron microscopy, respectively. Chemical analysis revealed the presence of an ion-rich layer constituted of abundant phosphates (PO C-HA nanocomplex conditioning of dentin before tricalcium silicate sealer application resulted in a chemically modified dentin substrate with an ion-rich layer consisting of phosphate, calcium, calcium phosphates, and chitosan that chemically modified the dentin surface/subsurface.

Identifiants

pubmed: 31594670
pii: S0099-2399(19)30625-9
doi: 10.1016/j.joen.2019.08.011
pii:
doi:

Substances chimiques

Calcium Compounds 0
Root Canal Filling Materials 0
Silicates 0
Chitosan 9012-76-4
Durapatite 91D9GV0Z28

Types de publication

Journal Article

Langues

eng

Pagination

1513-1521

Informations de copyright

Copyright © 2019 American Association of Endodontists. Published by Elsevier Inc. All rights reserved.

Auteurs

Anam Hashmi (A)

Kishen Lab, Faculty of Dentistry, University of Toronto, Ontario, Canada.

Rana N S Sodhi (RNS)

Ontario Centre for the Characterization of Advanced Materials, Department of Chemical Engineering and Applied Chemistry, University of Toronto, Ontario, Canada.

Anil Kishen (A)

Kishen Lab, Faculty of Dentistry, University of Toronto, Ontario, Canada; Department of Dentistry, Mount Sinai Health System, Mount Sinai Hospital, Toronto, Ontario, Canada. Electronic address: anil.kishen@utoronto.ca.

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Classifications MeSH