Controlling Catalyst-Free Formation and Hole Gas Accumulation by Fabricating Si/Ge Core-Shell and Si/Ge/Si Core-Double Shell Nanowires.

catalyst-free core−shell nanowire germanium hole gas accumulation nanoimprint silicon

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
26 Nov 2019
Historique:
pubmed: 19 10 2019
medline: 19 10 2019
entrez: 19 10 2019
Statut: ppublish

Résumé

The catalyst-free formation of silicon (Si) and germanium (Ge) core-shell and core-double shell nanowires (NWs) was studied for use as building blocks of high electron (hole) mobility transistors (HEMTs). Vertically aligned

Identifiants

pubmed: 31626528
doi: 10.1021/acsnano.9b06821
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

13403-13412

Auteurs

Xiaolong Zhang (X)

International Center for Materials Nanoarchitectonics , National Institute for Materials Science , Tsukuba , Ibaraki 3050044 , Japan.
Graduate School of Pure and Applied Sciences , University of Tsukuba , Tsukuba , Ibaraki 3058573 , Japan.

Wipakorn Jevasuwan (W)

International Center for Materials Nanoarchitectonics , National Institute for Materials Science , Tsukuba , Ibaraki 3050044 , Japan.

Yoshimasa Sugimoto (Y)

International Center for Materials Nanoarchitectonics , National Institute for Materials Science , Tsukuba , Ibaraki 3050044 , Japan.

Naoki Fukata (N)

International Center for Materials Nanoarchitectonics , National Institute for Materials Science , Tsukuba , Ibaraki 3050044 , Japan.
Graduate School of Pure and Applied Sciences , University of Tsukuba , Tsukuba , Ibaraki 3058573 , Japan.

Classifications MeSH