High-energy visible light at ambient doses and intensities induces oxidative stress of skin-Protective effects of the antioxidant and Nrf2 inducer Licochalcone A in vitro and in vivo.


Journal

Photodermatology, photoimmunology & photomedicine
ISSN: 1600-0781
Titre abrégé: Photodermatol Photoimmunol Photomed
Pays: England
ID NLM: 9013641

Informations de publication

Date de publication:
Mar 2020
Historique:
received: 16 01 2019
revised: 24 09 2019
accepted: 23 10 2019
pubmed: 30 10 2019
medline: 13 11 2020
entrez: 30 10 2019
Statut: ppublish

Résumé

Solar radiation causes skin damage through the generation of reactive oxygen species (ROS). While UV filters effectively reduce UV-induced ROS, they cannot prevent VIS-induced (400-760 nm) oxidative stress. Therefore, potent antioxidants are needed as additives to sunscreen products. We investigated VIS-induced ROS formation and the photoprotective effects of the Nrf2 inducer Licochalcone A (LicA). Visible spectrum of 400-500 nm dose-dependently induced ROS in cultured human fibroblasts at doses equivalent to 1 hour of sunshine on a sunny summer day (150 J/cm LicA may be a useful additive antioxidant for sunscreens.

Sections du résumé

BACKGROUND BACKGROUND
Solar radiation causes skin damage through the generation of reactive oxygen species (ROS). While UV filters effectively reduce UV-induced ROS, they cannot prevent VIS-induced (400-760 nm) oxidative stress. Therefore, potent antioxidants are needed as additives to sunscreen products.
METHODS METHODS
We investigated VIS-induced ROS formation and the photoprotective effects of the Nrf2 inducer Licochalcone A (LicA).
RESULTS RESULTS
Visible spectrum of 400-500 nm dose-dependently induced ROS in cultured human fibroblasts at doses equivalent to 1 hour of sunshine on a sunny summer day (150 J/cm
CONCLUSION CONCLUSIONS
LicA may be a useful additive antioxidant for sunscreens.

Identifiants

pubmed: 31661571
doi: 10.1111/phpp.12523
pmc: PMC7078816
doi:

Substances chimiques

Antioxidants 0
Chalcones 0
NF-E2-Related Factor 2 0
NFE2L2 protein, human 0
Sunscreening Agents 0
licochalcone A JTV5467968

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

135-144

Informations de copyright

© 2019 The Authors. Photodermatology, Photoimmunology & Photomedicine published by John Wiley & Sons Ltd.

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Auteurs

Tobias Mann (T)

Beiersdorf AG, Research and Development, Hamburg, Germany.

Kerstin Eggers (K)

Beiersdorf AG, Research and Development, Hamburg, Germany.

Frank Rippke (F)

Beiersdorf AG, Research and Development, Hamburg, Germany.

Mirko Tesch (M)

Beiersdorf AG, Research and Development, Hamburg, Germany.

Anette Buerger (A)

Beiersdorf AG, Research and Development, Hamburg, Germany.

Maxim E Darvin (ME)

Center of Experimental and Applied Cutaneous Physiology, Department of Dermatology, Venerology and Allergology, Charité - Universitätsmedizin Berlin, Berlin, Germany.

Sabine Schanzer (S)

Center of Experimental and Applied Cutaneous Physiology, Department of Dermatology, Venerology and Allergology, Charité - Universitätsmedizin Berlin, Berlin, Germany.

Martina C Meinke (MC)

Center of Experimental and Applied Cutaneous Physiology, Department of Dermatology, Venerology and Allergology, Charité - Universitätsmedizin Berlin, Berlin, Germany.

Jürgen Lademann (J)

Center of Experimental and Applied Cutaneous Physiology, Department of Dermatology, Venerology and Allergology, Charité - Universitätsmedizin Berlin, Berlin, Germany.

Ludger Kolbe (L)

Beiersdorf AG, Research and Development, Hamburg, Germany.

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Classifications MeSH