Self-Induced Growth of GaN Nanowall Structure on Si (111) by Laser Molecular Beam Epitaxy.


Journal

Journal of nanoscience and nanotechnology
ISSN: 1533-4899
Titre abrégé: J Nanosci Nanotechnol
Pays: United States
ID NLM: 101088195

Informations de publication

Date de publication:
01 Jun 2020
Historique:
entrez: 22 11 2019
pubmed: 22 11 2019
medline: 22 11 2019
Statut: ppublish

Résumé

Evolution of GaN nanostructure grown on Si (111) substrate has been studied systematically using laser molecular beam epitaxial process. The

Identifiants

pubmed: 31748096
doi: 10.1166/jnn.2020.17503
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3919-3924

Auteurs

Prashant Tyagi (P)

CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India; Academy of Scientific and Innovative Research (AcSIR), Ghaziabad 201002, India.

Ch Ramesh (C)

CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India; Academy of Scientific and Innovative Research (AcSIR), Ghaziabad 201002, India.

S S Kushvaha (SS)

CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India; Academy of Scientific and Innovative Research (AcSIR), Ghaziabad 201002, India.

Govind Gupta (G)

CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India; Academy of Scientific and Innovative Research (AcSIR), Ghaziabad 201002, India.

M Senthil Kumar (M)

CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India; Academy of Scientific and Innovative Research (AcSIR), Ghaziabad 201002, India.

Classifications MeSH