Enhanced Performance of AlGaN-Based Deep Ultraviolet Light-Emitting Diodes with Chirped Superlattice Electron Deceleration Layer.

APSYS AlGaN DUV LED MOCVD SEDL

Journal

Nanoscale research letters
ISSN: 1931-7573
Titre abrégé: Nanoscale Res Lett
Pays: United States
ID NLM: 101279750

Informations de publication

Date de publication:
21 Nov 2019
Historique:
received: 13 08 2019
accepted: 31 10 2019
entrez: 23 11 2019
pubmed: 23 11 2019
medline: 23 11 2019
Statut: epublish

Résumé

AlGaN-based deep ultraviolet (DUV) light-emitting diodes (LEDs) suffer from electron overflow and insufficient hole injection. In this paper, novel DUV LED structures with superlattice electron deceleration layer (SEDL) is proposed to decelerate the electrons injected to the active region and improve radiative recombination. The effects of several chirped SEDLs on the performance of DUV LEDs have been studied experimentally and numerically. The DUV LEDs have been grown by metal-organic chemical vapor deposition (MOCVD) and fabricated into 762 × 762 μm

Identifiants

pubmed: 31754922
doi: 10.1186/s11671-019-3201-x
pii: 10.1186/s11671-019-3201-x
pmc: PMC6872697
doi:

Types de publication

Journal Article

Langues

eng

Pagination

347

Subventions

Organisme : Key Project of Chinese National Development Programs
ID : 2016YFB0400901
Organisme : Key Laboratory of infrared imaging materials and detectors, Shanghai Institute of Technical Physics, Chinese Academy of Sciences
ID : IIMDKFJJ-17-09
Organisme : National Natural Science Foundation of China
ID : 61774065

Références

Opt Express. 2011 Sep 12;19(19):18319-23
pubmed: 21935200

Auteurs

Jiahui Hu (J)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Jun Zhang (J)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China. jzhang019@hust.edu.cn.

Yi Zhang (Y)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Huixue Zhang (H)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Hanling Long (H)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Qian Chen (Q)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Maocheng Shan (M)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Shida Du (S)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Jiangnan Dai (J)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Changqing Chen (C)

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China.

Classifications MeSH