Rigid Band Shifts in Two-Dimensional Semiconductors through External Dielectric Screening.


Journal

Physical review letters
ISSN: 1079-7114
Titre abrégé: Phys Rev Lett
Pays: United States
ID NLM: 0401141

Informations de publication

Date de publication:
15 Nov 2019
Historique:
received: 24 06 2019
entrez: 7 12 2019
pubmed: 7 12 2019
medline: 7 12 2019
Statut: ppublish

Résumé

We investigate the effects of external dielectric screening on the electronic dispersion and the band gap in the atomically thin, quasi-two-dimensional (2D) semiconductor WS_{2} using angle-resolved photoemission and optical spectroscopies, along with first-principles calculations. We find the main effect of increased external dielectric screening to be a reduction of the quasiparticle band gap, with rigid shifts to the bands themselves. Specifically, the band gap of monolayer WS_{2} is decreased by about 140 meV on a graphite substrate as compared to a hexagonal boron nitride substrate, while the electronic dispersion of WS_{2} remains unchanged within our experimental precision of 17 meV. These essentially rigid shifts of the valence and conduction bands result from the special spatial structure of the changes in the Coulomb potential induced by the dielectric environment of the monolayer.

Identifiants

pubmed: 31809088
doi: 10.1103/PhysRevLett.123.206403
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

206403

Auteurs

Lutz Waldecker (L)

Department of Applied Physics, Stanford University, 348 Via Pueblo Mall, Stanford, California 94305, USA.
SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA.

Archana Raja (A)

Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.
Kavli Energy NanoScience Institute, University of California Berkeley, Berkeley, California 94720, USA.

Malte Rösner (M)

Institute for Molecules and Materials, Radboud University, 6525 AJ Nijmengen, Netherlands.

Christina Steinke (C)

Institute for Theoretical Physics, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.
Bremen Center for Computational Material Sciences, University of Bremen, Am Fallturm 1a, 28359 Bremen, Germany.

Aaron Bostwick (A)

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

Roland J Koch (RJ)

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

Chris Jozwiak (C)

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

Takashi Taniguchi (T)

National Institute for Materials Science, Tsukuba, Ibaraki 305-004, Japan.

Kenji Watanabe (K)

National Institute for Materials Science, Tsukuba, Ibaraki 305-004, Japan.

Eli Rotenberg (E)

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

Tim O Wehling (TO)

Institute for Theoretical Physics, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.
Bremen Center for Computational Material Sciences, University of Bremen, Am Fallturm 1a, 28359 Bremen, Germany.

Tony F Heinz (TF)

Department of Applied Physics, Stanford University, 348 Via Pueblo Mall, Stanford, California 94305, USA.
SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA.

Classifications MeSH