Stabilization of point-defect spin qubits by quantum wells.


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
06 12 2019
Historique:
received: 26 07 2018
accepted: 12 11 2019
entrez: 8 12 2019
pubmed: 8 12 2019
medline: 8 12 2019
Statut: epublish

Résumé

Defect-based quantum systems in wide bandgap semiconductors are strong candidates for scalable quantum-information technologies. However, these systems are often complicated by charge-state instabilities and interference by phonons, which can diminish spin-initialization fidelities and limit room-temperature operation. Here, we identify a pathway around these drawbacks by showing that an engineered quantum well can stabilize the charge state of a qubit. Using density-functional theory and experimental synchrotron X-ray diffraction studies, we construct a model for previously unattributed point defect centers in silicon carbide as a near-stacking fault axial divacancy and show how this model explains these defects' robustness against photoionization and room temperature stability. These results provide a materials-based solution to the optical instability of color centers in semiconductors, paving the way for the development of robust single-photon sources and spin qubits.

Identifiants

pubmed: 31811137
doi: 10.1038/s41467-019-13495-6
pii: 10.1038/s41467-019-13495-6
pmc: PMC6898666
doi:

Types de publication

Journal Article Research Support, U.S. Gov't, Non-P.H.S. Research Support, Non-U.S. Gov't

Langues

eng

Sous-ensembles de citation

IM

Pagination

5607

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Auteurs

Viktor Ivády (V)

Wigner Research Centre for Physics, PO Box 49, H-1525, Budapest, Hungary.
Department of Physics, Chemistry and Biology, Linköping University, SE-581 83, Linköping, Sweden.

Joel Davidsson (J)

Department of Physics, Chemistry and Biology, Linköping University, SE-581 83, Linköping, Sweden.

Nazar Delegan (N)

Center for Molecular Engineering, Argonne National Laboratory, Lemont, IL, USA.
Materials Science Division, Argonne National Laboratory, Lemont, IL, USA.

Abram L Falk (AL)

Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.
IBM T.J. Watson Research Center, Yorktown Heights, NY, USA.

Paul V Klimov (PV)

Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.

Samuel J Whiteley (SJ)

Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.

Stephan O Hruszkewycz (SO)

Materials Science Division, Argonne National Laboratory, Lemont, IL, USA.

Martin V Holt (MV)

Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL, USA.

F Joseph Heremans (FJ)

Center for Molecular Engineering, Argonne National Laboratory, Lemont, IL, USA.
Materials Science Division, Argonne National Laboratory, Lemont, IL, USA.
Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.

Nguyen Tien Son (NT)

Department of Physics, Chemistry and Biology, Linköping University, SE-581 83, Linköping, Sweden.

David D Awschalom (DD)

Center for Molecular Engineering, Argonne National Laboratory, Lemont, IL, USA.
Materials Science Division, Argonne National Laboratory, Lemont, IL, USA.
Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.

Igor A Abrikosov (IA)

Department of Physics, Chemistry and Biology, Linköping University, SE-581 83, Linköping, Sweden.
Materials Modeling and Development Laboratory, National University of Science and Technology 'MISIS', 119049, Moscow, Russia.

Adam Gali (A)

Wigner Research Centre for Physics, PO Box 49, H-1525, Budapest, Hungary. gali.adam@wigner.mta.hu.
Department of Atomic Physics, Budapest University of Technology and Economics, Budafoki út 8., H-1111, Budapest, Hungary. gali.adam@wigner.mta.hu.

Classifications MeSH