Random Telegraph Noises from the Source Follower, the Photodiode Dark Current, and the Gate-Induced Sense Node Leakage in CMOS Image Sensors.

CMOS image sensor (CIS) MOSFET channel RTN (MC-RTN) X-ray irradiation correlated double sampling (CDS) correlated multiple sampling (CMS) dark current (DC) gate induced drain leakage (GIDL) random telegraph noise (RTN) random telegraph signal (RTS) variable junction leakage (VJL)

Journal

Sensors (Basel, Switzerland)
ISSN: 1424-8220
Titre abrégé: Sensors (Basel)
Pays: Switzerland
ID NLM: 101204366

Informations de publication

Date de publication:
10 Dec 2019
Historique:
received: 25 10 2019
revised: 04 12 2019
accepted: 07 12 2019
entrez: 15 12 2019
pubmed: 15 12 2019
medline: 15 12 2019
Statut: epublish

Résumé

In this paper we present a systematic approach to sort out different types of random telegraph noises (RTN) in CMOS image sensors (CIS) by examining their dependencies on the transfer gate off-voltage, the reset gate off-voltage, the photodiode integration time, and the sense node charge retention time. Besides the well-known source follower RTN, we have identified the RTN caused by varying photodiode dark current, transfer-gate and reset-gate induced sense node leakage. These four types of RTN and the dark signal shot noises dominate the noise distribution tails of CIS and non-CIS chips under test, either with or without X-ray irradiation. The effect of correlated multiple sampling (CMS) on noise reduction is studied and a theoretical model is developed to account for the measurement results.

Identifiants

pubmed: 31835566
pii: s19245447
doi: 10.3390/s19245447
pmc: PMC6960882
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Références

Sensors (Basel). 2010;10(10):9139-54
pubmed: 22163400
Sensors (Basel). 2016 Nov 06;16(11):
pubmed: 27827972
Sensors (Basel). 2017 Nov 23;17(12):
pubmed: 29168778
Sensors (Basel). 2019 Dec 16;19(24):null
pubmed: 31888151

Auteurs

Calvin Yi-Ping Chao (CY)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Shang-Fu Yeh (SF)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Meng-Hsu Wu (MH)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Kuo-Yu Chou (KY)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Honyih Tu (H)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Chih-Lin Lee (CL)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Chin Yin (C)

Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 30077, Taiwan.

Philippe Paillet (P)

CEA, DAM, DIF, F-91297 Arpajon, France.

Vincent Goiffon (V)

ISAE-SUPAERO, Université de Toulouse, 31055 Toulouse, France.

Classifications MeSH