Block copolymers containing stable radical and fluorinated blocks with long-range ordered morphologies prepared by anionic polymerization.


Journal

Polymer chemistry
ISSN: 1759-9954
Titre abrégé: Polym Chem
Pays: England
ID NLM: 101562526

Informations de publication

Date de publication:
07 Oct 2019
Historique:
entrez: 20 12 2019
pubmed: 20 12 2019
medline: 20 12 2019
Statut: ppublish

Résumé

We report a facile synthetic approach to create stable radical block copolymers containing a secondary fluorinated block via anionic polymerization using a bulky, sterically hindered countercation composed of a sodium ion and di-benzo-18-crown-6 complex. The synthetic conditions described in this report allowed for controlled molecular weights and dispersity (<1.3) of both homopolymers: poly(2,2,6,6-tetramethyl-1-piperidinyloxy-methacrylate) (PTMA) and poly(2,2,2-trifluoroethyl methacrylate) (PTFEMA) as well as their block copolymers (PTMA-

Identifiants

pubmed: 31853268
doi: 10.1039/c9py00416e
pmc: PMC6919551
mid: NIHMS1048445
doi:

Types de publication

Journal Article

Langues

eng

Pagination

5094-5102

Subventions

Organisme : NIGMS NIH HHS
ID : P41 GM103521
Pays : United States

Déclaration de conflit d'intérêts

Conflicts of interest There are no conflicts to declare.

Références

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Auteurs

Alicia Cintora (A)

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA.

Hiroki Takano (H)

Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, Japan.

Mohit Khurana (M)

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA.

Alvin Chandra (A)

Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, Japan.

Teruaki Hayakawa (T)

Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, Japan.

Christopher K Ober (CK)

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA.

Classifications MeSH