In-Situ Deposition of Graphene Oxide Catalyst for Efficient Photoelectrochemical Hydrogen Evolution Reaction Using Atmospheric Plasma.
atmospheric plasma
graphene oxide
hydrogen
hydrophilicity
hydrophobicity
photoelectrochemical cell
Journal
Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929
Informations de publication
Date de publication:
18 Dec 2019
18 Dec 2019
Historique:
received:
16
11
2019
revised:
13
12
2019
accepted:
14
12
2019
entrez:
22
12
2019
pubmed:
22
12
2019
medline:
22
12
2019
Statut:
epublish
Résumé
The vacuum deposition method requires high energy and temperature. Hydrophobic reduced graphene oxide (rGO) can be obtained by plasma-enhanced chemical vapor deposition under atmospheric pressure, which shows the hydrophobic surface property. Further, to compare the effect of hydrophobic and the hydrophilic nature of catalysts in the photoelectrochemical cell (PEC), the prepared rGO was additionally treated with plasma that attaches oxygen functional groups effectively to obtain hydrophilic graphene oxide (GO). The hydrogen evolution reaction (HER) electrocatalytic activity of the hydrophobic rGO and hydrophilic GO deposited on the p-type Si wafer was analyzed. Herein, we have proposed a facile way to directly deposit the surface property engineered GO.
Identifiants
pubmed: 31861397
pii: ma13010012
doi: 10.3390/ma13010012
pmc: PMC6981421
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : National Research Foundation of Korea
ID : 2018R1A5A1025224
Organisme : Korea Institute of Energy Technology Evaluation and Planning
ID : 20194030202470
Organisme : Korea Institute of Materials Science
ID : PNK 6050
Déclaration de conflit d'intérêts
The authors declare no conflict of interest.
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