Combined wet lithography and fractional precipitation as a tool for fabrication of spatially controlled nanostructures of poly(3-hexylthiophene) ordered aggregates.
Journal
Nanoscale
ISSN: 2040-3372
Titre abrégé: Nanoscale
Pays: England
ID NLM: 101525249
Informations de publication
Date de publication:
23 Jan 2020
23 Jan 2020
Historique:
pubmed:
9
1
2020
medline:
9
1
2020
entrez:
9
1
2020
Statut:
ppublish
Résumé
Herein, we propose an easy and practical method for the fabrication of highly ordered supramolecular structures. The proposed approach combines fractional precipitation and wet lithography, to obtain a spatially-defined pattern of submicrometric structures with a high molecular order of poly(3-hexylthiophene). The process is demonstrated by XRD, confocal and time-resolved spectroscopy and by the performance of an effective field effect transistor.
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM