Combined wet lithography and fractional precipitation as a tool for fabrication of spatially controlled nanostructures of poly(3-hexylthiophene) ordered aggregates.


Journal

Nanoscale
ISSN: 2040-3372
Titre abrégé: Nanoscale
Pays: England
ID NLM: 101525249

Informations de publication

Date de publication:
23 Jan 2020
Historique:
pubmed: 9 1 2020
medline: 9 1 2020
entrez: 9 1 2020
Statut: ppublish

Résumé

Herein, we propose an easy and practical method for the fabrication of highly ordered supramolecular structures. The proposed approach combines fractional precipitation and wet lithography, to obtain a spatially-defined pattern of submicrometric structures with a high molecular order of poly(3-hexylthiophene). The process is demonstrated by XRD, confocal and time-resolved spectroscopy and by the performance of an effective field effect transistor.

Identifiants

pubmed: 31912835
doi: 10.1039/c9nr10057a
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

1432-1437

Auteurs

Lorena Di Silvio (L)

Istituto per lo Studio dei Materiali Nanostrutturati, Consiglio Nazionale delle Ricerche, via Gobetti 101, 40129 Bologna, Italy. massimiliano.cavallini@cnr.it.

Classifications MeSH