Characteristics of GaN-Based Nanowire Gate-All-Around (GAA) Transistors.


Journal

Journal of nanoscience and nanotechnology
ISSN: 1533-4899
Titre abrégé: J Nanosci Nanotechnol
Pays: United States
ID NLM: 101088195

Informations de publication

Date de publication:
01 Jul 2020
Historique:
entrez: 24 1 2020
pubmed: 24 1 2020
medline: 24 1 2020
Statut: ppublish

Résumé

We investigate the DC,

Identifiants

pubmed: 31968458
doi: 10.1166/jnn.2020.17784
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

4282-4286

Auteurs

Ki-Sik Im (KS)

Advanced Material Research Center and 2Department of Advanced Materials Science and Engineering, Kumoh National Institute of Technology, Gumi, 39177, Korea.

Mallem Siva Pratap Reddy (MSP)

School of Electronics Engineering, Kyungpook National University, Daegu, 41566, Korea.

Youngmin Hwang (Y)

Advanced Material Research Center and 2Department of Advanced Materials Science and Engineering, Kumoh National Institute of Technology, Gumi, 39177, Korea.

Jung-Hee Lee (JH)

School of Electronics Engineering, Kyungpook National University, Daegu, 41566, Korea.

Classifications MeSH