Towards standardisation of contact and contactless electrical measurements of CVD graphene at the macro-, micro- and nano-scale.


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
21 Feb 2020
Historique:
received: 01 05 2019
accepted: 05 12 2019
entrez: 22 2 2020
pubmed: 23 2 2020
medline: 23 2 2020
Statut: epublish

Résumé

Graphene has become the focus of extensive research efforts and it can now be produced in wafer-scale. For the development of next generation graphene-based electronic components, electrical characterization of graphene is imperative and requires the measurement of work function, sheet resistance, carrier concentration and mobility in both macro-, micro- and nano-scale. Moreover, commercial applications of graphene require fast and large-area mapping of electrical properties, rather than obtaining a single point value, which should be ideally achieved by a contactless measurement technique. We demonstrate a comprehensive methodology for measurements of the electrical properties of graphene that ranges from nano- to macro- scales, while balancing the acquisition time and maintaining the robust quality control and reproducibility between contact and contactless methods. The electrical characterisation is achieved by using a combination of techniques, including magneto-transport in the van der Pauw geometry, THz time-domain spectroscopy mapping and calibrated Kelvin probe force microscopy. The results exhibit excellent agreement between the different techniques. Moreover, we highlight the need for standardized electrical measurements in highly controlled environmental conditions and the application of appropriate weighting functions.

Identifiants

pubmed: 32081982
doi: 10.1038/s41598-020-59851-1
pii: 10.1038/s41598-020-59851-1
pmc: PMC7035257
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3223

Subventions

Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : European Association of National Metrology Institutes
ID : 16NRM01 GRACE
Organisme : Horizon 2020 Framework Programme
ID : 785219
Organisme : Horizon 2020 Framework Programme
ID : 785219

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Auteurs

Christos Melios (C)

National Physical Laboratory, Teddington, TW11 0LW, United Kingdom.
Department of Electrical and Computer Engineering, Faculty of Engineering, University of Cyprus, 1687, Nicosia, Cyprus.

Nathaniel Huang (N)

National Physical Laboratory, Teddington, TW11 0LW, United Kingdom.

Luca Callegaro (L)

Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce 91, 10135, Torino, Italy.

Alba Centeno (A)

Graphenea SA, 20018, Donostia-San Sebastián, Spain.

Alessandro Cultrera (A)

Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce 91, 10135, Torino, Italy.

Alvaro Cordon (A)

Das-Nano, Poligono Industrial Talluntxe II, Calle M-10, 31192, Tajonar, Navarra, Spain.

Vishal Panchal (V)

National Physical Laboratory, Teddington, TW11 0LW, United Kingdom.

Israel Arnedo (I)

Das-Nano, Poligono Industrial Talluntxe II, Calle M-10, 31192, Tajonar, Navarra, Spain.

Albert Redo-Sanchez (A)

Das-Nano, Poligono Industrial Talluntxe II, Calle M-10, 31192, Tajonar, Navarra, Spain.

David Etayo (D)

Das-Nano, Poligono Industrial Talluntxe II, Calle M-10, 31192, Tajonar, Navarra, Spain.

Montserrat Fernandez (M)

Das-Nano, Poligono Industrial Talluntxe II, Calle M-10, 31192, Tajonar, Navarra, Spain.

Alex Lopez (A)

Das-Nano, Poligono Industrial Talluntxe II, Calle M-10, 31192, Tajonar, Navarra, Spain.

Sergiy Rozhko (S)

National Physical Laboratory, Teddington, TW11 0LW, United Kingdom.

Oihana Txoperena (O)

Graphenea SA, 20018, Donostia-San Sebastián, Spain.

Amaia Zurutuza (A)

Graphenea SA, 20018, Donostia-San Sebastián, Spain.

Olga Kazakova (O)

National Physical Laboratory, Teddington, TW11 0LW, United Kingdom. olga.kazakova@npl.co.uk.

Classifications MeSH