Low Energy Implantation into Transition-Metal Dichalcogenide Monolayers to Form Janus Structures.

2D materials Janus monolayer conversion implantation pulsed laser deposition synthesis and processing transition-metal dichalcogenide

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
28 Apr 2020
Historique:
pubmed: 10 3 2020
medline: 10 3 2020
entrez: 10 3 2020
Statut: ppublish

Résumé

Atomically thin two-dimensional (2D) materials face significant energy barriers for synthesis and processing into functional metastable phases such as Janus structures. Here, the controllable implantation of hyperthermal species from pulsed laser deposition (PLD) plasmas is introduced as a top-down method to compositionally engineer 2D monolayers. The kinetic energies of Se clusters impinging on suspended monolayer WS

Identifiants

pubmed: 32150384
doi: 10.1021/acsnano.9b10196
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3896-3906

Auteurs

Yu-Chuan Lin (YC)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Chenze Liu (C)

Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, United States.

Yiling Yu (Y)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Eva Zarkadoula (E)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States.

Mina Yoon (M)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Alexander A Puretzky (AA)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Liangbo Liang (L)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Xiangru Kong (X)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Yiyi Gu (Y)

Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, United States.
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China.

Alex Strasser (A)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.
Artie McFerrin Department of Chemical Engineering, Texas A&M University, College Station, Texas 77840, United States.

Harry M Meyer (HM)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Matthias Lorenz (M)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Matthew F Chisholm (MF)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Ilia N Ivanov (IN)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Christopher M Rouleau (CM)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Gerd Duscher (G)

Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, United States.

Kai Xiao (K)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

David B Geohegan (DB)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory Oak Ridge, Tennessee 37831, United States.

Classifications MeSH