Pulsed Laser Deposition of Bismuth Vanadate Thin Films-The Effect of Oxygen Pressure on the Morphology, Composition, and Photoelectrochemical Performance.
bismuth vanadate
photoelectrochemistry
pulsed laser deposition
Journal
Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929
Informations de publication
Date de publication:
17 Mar 2020
17 Mar 2020
Historique:
received:
13
02
2020
revised:
12
03
2020
accepted:
13
03
2020
entrez:
21
3
2020
pubmed:
21
3
2020
medline:
21
3
2020
Statut:
epublish
Résumé
Thin layers of bismuth vanadate were deposited using the pulsed laser deposition technique on commercially available FTO (fluorine-doped tin oxide) substrates. Films were sputtered from a sintered, monoclinic BiVO
Identifiants
pubmed: 32192186
pii: ma13061360
doi: 10.3390/ma13061360
pmc: PMC7143622
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : Narodowe Centrum Badań i Rozwoju
ID : LIDER/15/0088/L-10/18/NCBR/2019
Organisme : Politechnika Gdańska
ID : DS 033209
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