A Comparative Study of Compressible and Conductive Vertically Aligned Carbon Nanotube Forest in Different Polymer Matrixes for High-Performance Piezoresistive Force Sensors.

epoxy resins force sensors piezoresistive effect polydimethylsiloxane polymer nanocomposites polyurethane strain sensors vertically aligned carbon nanotubes

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
08 Apr 2020
Historique:
pubmed: 21 3 2020
medline: 21 3 2020
entrez: 21 3 2020
Statut: ppublish

Résumé

In the present scenario, conducting and lightweight flexible polymer nanocomposites rival metallic and inorganic semiconducting materials as highly sensitive piezoresistive force sensors. Herein, we explore the feasibility of vertically aligned carbon nanotube (VACNT) nanocomposites impregnated in different polymer matrixes, envisioned as highly efficient piezoresistors in sensor applications. Polymer nanocomposites are selectively designed and fabricated using three different polymer matrixes, i.e., polydimethylsiloxane (PDMS), polyurethane (PU), and epoxy resins with ideal reinforcement of VACNTs to enhance the thermal stability, conductivity, compressibility, piezoresistivity, and sensitivity of these nanocomposites. To predict the best piezoresistive force sensor, we evaluated the structural, optical, thermal, electrical, mechanical, and piezoresistive properties of the nanocomposites using field-emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), Raman spectroscopy, thermogravimetric analysis (TGA),

Identifiants

pubmed: 32196304
doi: 10.1021/acsami.0c01779
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

16946-16958

Auteurs

Sharon J Paul (SJ)

Department of Chemistry, Institute of Basic Science, Bundelkhand University, Jhansi, Uttar Pradesh 284128, India.
Photonic Materials Metrology Sub Division Advanced Materials and Device Metrology Division, CSIR-National Physical Laboratory, New Delhi 110012, India.

Indu Sharma (I)

Photonic Materials Metrology Sub Division Advanced Materials and Device Metrology Division, CSIR-National Physical Laboratory, New Delhi 110012, India.

Indu Elizabeth (I)

Force and Hardness Metrology Sub Division, Physico-Mechanical Metrology Division CSIR-National Physical Laboratory, New Delhi 110012, India.

Bhaskar Gahtori (B)

Advanced Carbon Products Sub Division, Advanced Materials and Device Metrology Division, CSIR-National Physical Laboratory, New Delhi 110012, India.

Manikandan R M (MR)

Force and Hardness Metrology Sub Division, Physico-Mechanical Metrology Division CSIR-National Physical Laboratory, New Delhi 110012, India.

S Seelakumar Titus (SS)

Force and Hardness Metrology Sub Division, Physico-Mechanical Metrology Division CSIR-National Physical Laboratory, New Delhi 110012, India.

Prakash Chandra (P)

Department of Chemistry, Institute of Basic Science, Bundelkhand University, Jhansi, Uttar Pradesh 284128, India.

Bipin Kumar Gupta (BK)

Photonic Materials Metrology Sub Division Advanced Materials and Device Metrology Division, CSIR-National Physical Laboratory, New Delhi 110012, India.

Classifications MeSH