Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength.


Journal

Applied optics
ISSN: 1539-4522
Titre abrégé: Appl Opt
Pays: United States
ID NLM: 0247660

Informations de publication

Date de publication:
20 Feb 2020
Historique:
entrez: 1 4 2020
pubmed: 1 4 2020
medline: 1 4 2020
Statut: ppublish

Résumé

A novel, to the best of our knowledge, method of wet chemical etching of sapphire workpieces (such as optics, wafers, windows, and cones), called the sapphire advanced mitigation process (or sapphire AMP), has been developed that exposes sub-surface mechanical damage created during the optical fabrication process and significantly enhances the surface laser damage resistance ($ \gt {2{\times}}$>2×) and mechanical strength (up to $\sim{2.6{\times}}$∼2.6×). Sapphire AMP involves first treating the workpiece with a mixture of sulfuric and phosphoric acid $([{\rm H_{2}{\rm SO_{4}}}]:[{\rm H_{3}{\rm PO_{4}}}]=1:3)$([H

Identifiants

pubmed: 32225658
pii: 427353
doi: 10.1364/AO.381739
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

1602-1610

Auteurs

Classifications MeSH