Imaging and quantification of charged domain walls in BiFeO


Journal

Nanoscale
ISSN: 2040-3372
Titre abrégé: Nanoscale
Pays: England
ID NLM: 101525249

Informations de publication

Date de publication:
30 Apr 2020
Historique:
pubmed: 17 4 2020
medline: 17 4 2020
entrez: 17 4 2020
Statut: ppublish

Résumé

Charged domain walls in ferroelectrics hold great promise for the design of novel electronic devices due to their enhanced local conductivity. In fact, charged domain walls show unique properties including the possibility of being created, moved and erased by an applied voltage. Here, we demonstrate that the charged domain walls are constituted by a core region where most of the screening charge is localized and such charge accumulation is responsible for their enhanced conductivity. In particular, the link between the local structural distortions and charge screening phenomena in 109° tail-to-tail domain walls of BiFeO3 is elucidated by a series of multiscale analysis performed by means of scanning probe techniques, including conductive atomic force microscopy (cAFM) and atomic resolution differential phase contrast scanning transmission electron microscopy (DPC-STEM). The results prove that an accumulation of oxygen vacancies occurs at the tail-to-tail domain walls as the leading charge screening process. This work constitutes a new insight in understanding the behavior of such complex systems and lays down the fundaments for their implementation into novel nanoelectronic devices.

Identifiants

pubmed: 32297890
doi: 10.1039/d0nr01258k
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

9186-9193

Auteurs

Marco Campanini (M)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstr. 129, 8600 Dübendorf, Switzerland. marco.campanini@empa.ch.

Classifications MeSH