Remote Doping of Scalable Nanowire Branches.

InGaAs nanowires selective-area epitaxy spin−orbit interaction weak anti-localization

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
13 May 2020
Historique:
pubmed: 22 4 2020
medline: 22 4 2020
entrez: 22 4 2020
Statut: ppublish

Résumé

Selective-area epitaxy provides a path toward high crystal quality, scalable, complex nanowire networks. These high-quality networks could be used in topological quantum computing as well as in ultrafast photodetection schemes. Control of the carrier density and mean free path in these devices is key for all of these applications. Factors that affect the mean free path include scattering by surfaces, donors, defects, and impurities. Here, we demonstrate how to reduce donor scattering in InGaAs nanowire networks by adopting a remote-doping strategy. Low-temperature magnetotransport measurements indicate weak anti-localization-a signature of strong spin-orbit interaction-across a nanowire Y-junction. This work serves as a blueprint for achieving remotely doped, ultraclean, and scalable nanowire networks for quantum technologies.

Identifiants

pubmed: 32315191
doi: 10.1021/acs.nanolett.0c00517
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3577-3584

Auteurs

Martin Friedl (M)

Institute of Materials, Faculty of Engineering, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.

Kris Cerveny (K)

Department of Physics, University of Basel, Basel, Switzerland.

Chunyi Huang (C)

Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois, United States.

Didem Dede (D)

Institute of Materials, Faculty of Engineering, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.

Mohammad Samani (M)

Department of Physics, University of Basel, Basel, Switzerland.

Megan O Hill (MO)

Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois, United States.

Nicholas Morgan (N)

Institute of Materials, Faculty of Engineering, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.

Wonjong Kim (W)

Institute of Materials, Faculty of Engineering, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.

Lucas Güniat (L)

Institute of Materials, Faculty of Engineering, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.

Jaime Segura-Ruiz (J)

ESRF: the European Synchrotron, Grenoble, 38043, France.

Lincoln J Lauhon (LJ)

Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois, United States.

Dominik M Zumbühl (DM)

Department of Physics, University of Basel, Basel, Switzerland.

Anna Fontcuberta I Morral (A)

Institute of Materials, Faculty of Engineering, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.
Institute of Physics, Faculty of Basic Sciences, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland.

Classifications MeSH