High-Rate Printing of Micro/Nanoscale Patterns Using Interfacial Convective Assembly.

Marangoni flow convection directed assembly nanoparticles printing

Journal

Advanced materials (Deerfield Beach, Fla.)
ISSN: 1521-4095
Titre abrégé: Adv Mater
Pays: Germany
ID NLM: 9885358

Informations de publication

Date de publication:
Jun 2020
Historique:
received: 02 02 2020
revised: 17 03 2020
accepted: 18 03 2020
pubmed: 24 4 2020
medline: 24 4 2020
entrez: 24 4 2020
Statut: ppublish

Résumé

Printing of electronics has been receiving increasing attention from academia and industry over the recent years. However, commonly used printing techniques have limited resolution of micro- or sub-microscale. Here, a directed-assembly-based printing technique, interfacial convective assembly, is reported, which utilizes a substrate-heating-induced solutal Marangoni convective flow to drive particles toward patterned substrates and then uses van der Waals interactions as well as geometrical confinement to trap the particles in the pattern areas. The influence of various assembly parameters including type of mixing solvent, substrate temperature, particle concentration, and assembly time is investigated. The results show successful assembly of various nanoparticles in patterns of different shapes with a high resolution down to 25 nm. In addition, the assembly only takes a few minutes, which is two orders of magnitude faster than conventional convective assembly. Small-sized (diameter below 5 nm) nanoparticles tend to coalesce during the assembly process and form sintered structures. The fabricated silver nanorods show single-crystal structure with a low resistivity of 8.58 × 10

Identifiants

pubmed: 32323404
doi: 10.1002/adma.202000747
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

e2000747

Subventions

Organisme : National Science Foundation Nanoscale Science and Engineering Center
ID : EEC-0832785
Organisme : Massachusetts Technology Collaborative

Informations de copyright

© 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Auteurs

Zhimin Chai (Z)

NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing (CHN), Northeastern University, Boston, MA, 02115, USA.

Adnan Korkmaz (A)

NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing (CHN), Northeastern University, Boston, MA, 02115, USA.

Cihan Yilmaz (C)

NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing (CHN), Northeastern University, Boston, MA, 02115, USA.

Ahmed A Busnaina (AA)

NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing (CHN), Northeastern University, Boston, MA, 02115, USA.

Classifications MeSH