Development of Method Enhanced Laser Ablation Efficiency According to Fine Curvature of the Polymer through the Preliminary Preparation Process Using UV Picosecond Laser.

artificial chimney enhanced laser ablation efficiency fine curvature of polymer laser ablation picosecond pulse laser

Journal

Polymers
ISSN: 2073-4360
Titre abrégé: Polymers (Basel)
Pays: Switzerland
ID NLM: 101545357

Informations de publication

Date de publication:
20 Apr 2020
Historique:
received: 24 03 2020
revised: 10 04 2020
accepted: 18 04 2020
entrez: 25 4 2020
pubmed: 25 4 2020
medline: 25 4 2020
Statut: epublish

Résumé

In processes using the ultrashort pulsed laser, the phenomenon that the ablation efficiency is reduced due to the increase of the shielding effect of the generated plume is increasingly caused by the use of the high power and high repetition rate. A new method is needed to prevent a decrease in ablation efficiency in processing using an ultrashort pulsed laser. In this study, the proposed a processing method that can improve the ablation efficiency by providing an efficient escape path of plume, and examine the feasibility of a new processing method. The new method we proposed is a method of laser processing after generating a fine curvature in the polymer as a preliminary preparation. The fine curvature of the polymer produced by the preliminary preparation induces an artificial chimney-like opening along the path of the incident beam during laser processing, thereby enabling the plume to be effectively removed. The experiment for examine the feasibility through a new method was conducted using a 10-picosecond laser of UV wavelength with two optical systems. As a new processing method, when processing with ultrashort pulse laser, it was observed that the ablation efficiency improved.

Identifiants

pubmed: 32326037
pii: polym12040959
doi: 10.3390/polym12040959
pmc: PMC7240741
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Ministry of Trade, Industry and Energy
ID : N0000598

Déclaration de conflit d'intérêts

The authors declare no conflict of interest.

Références

Sci Rep. 2016 Dec 19;6:39133
pubmed: 27991543
Nanoscale. 2015 Nov 7;7(41):17516-22
pubmed: 26444436
Materials (Basel). 2016 Jul 16;9(7):
pubmed: 28773704
Opt Express. 2011 May 23;19(11):10714-27
pubmed: 21643328
Nanotechnology. 2011 May 13;22(19):195706
pubmed: 21430316
Opt Express. 2005 May 2;13(9):3208-17
pubmed: 19495220

Auteurs

Seung Sik Ham (SS)

Institute for Nanophotonics Applications, Kyungpook National University, 80, Daehak-ro, Buk-gu, Daegu 41566, Korea.

Ho Lee (H)

Institute for Nanophotonics Applications, Kyungpook National University, 80, Daehak-ro, Buk-gu, Daegu 41566, Korea.
School of Mechanical Engineering, Kyungpook National University, 80, Daehak-ro, Buk-gu, Daegu 41566, Korea.
Laser Application Center, Kyungpook National University, 70, Dongnae-ro, Dong-gu, Daegu 41061, Korea.

Classifications MeSH