High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse.
Nanophotonics and plasmonics
Ultrafast lasers
Journal
Light, science & applications
ISSN: 2047-7538
Titre abrégé: Light Sci Appl
Pays: England
ID NLM: 101610753
Informations de publication
Date de publication:
2020
2020
Historique:
received:
16
12
2019
revised:
01
04
2020
accepted:
07
04
2020
entrez:
1
5
2020
pubmed:
1
5
2020
medline:
1
5
2020
Statut:
epublish
Résumé
Micro/nanoprocessing of graphene surfaces has attracted significant interest for both science and applications due to its effective modulation of material properties, which, however, is usually restricted by the disadvantages of the current fabrication methods. Here, by exploiting cylindrical focusing of a femtosecond laser on graphene oxide (GO) films, we successfully produce uniform subwavelength grating structures at high speed along with a simultaneous in situ photoreduction process. Strikingly, the well-defined structures feature orientations parallel to the laser polarization and significant robustness against distinct perturbations. The proposed model and simulations reveal that the structure formation is based on the transverse electric (TE) surface plasmons triggered by the gradient reduction of the GO film from its surface to the interior, which eventually results in interference intensity fringes and spatially periodic interactions. Further experiments prove that such a regular structured surface can cause enhanced optical absorption (>20%) and an anisotropic photoresponse (~0.46 ratio) for the reduced GO film. Our work not only provides new insights into understanding the laser-GO interaction but also lays a solid foundation for practical usage of femtosecond laser plasmonic lithography, with the prospect of expansion to other two-dimensional materials for novel device applications.
Identifiants
pubmed: 32351693
doi: 10.1038/s41377-020-0311-2
pii: 311
pmc: PMC7183510
doi:
Types de publication
Journal Article
Langues
eng
Pagination
69Informations de copyright
© The Author(s) 2020.
Déclaration de conflit d'intérêts
Conflict of interestThe authors declare that they have no conflict of interest.
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