Silicon Multi-Pass Gas Cell for Chip-Scale Gas Analysis by Absorption Spectroscopy.

circular multi-pass cell gas sensing silicon integrated

Journal

Micromachines
ISSN: 2072-666X
Titre abrégé: Micromachines (Basel)
Pays: Switzerland
ID NLM: 101640903

Informations de publication

Date de publication:
28 Apr 2020
Historique:
received: 06 04 2020
revised: 23 04 2020
accepted: 27 04 2020
entrez: 2 5 2020
pubmed: 2 5 2020
medline: 2 5 2020
Statut: epublish

Résumé

Semiconductor and micro-electromechanical system (MEMS) technologies have been already proved as strong solutions for producing miniaturized optical spectrometers, light sources and photodetectors. However, the implementation of optical absorption spectroscopy for in-situ gas analysis requires further integration of a gas cell using the same technologies towards full integration of a complete gas analysis system-on-chip. Here, we propose design guidelines and experimental validation of a gas cell fabricated using MEMS technology. The architecture is based on a circular multi-pass gas cell in a miniaturized form. Simulation results based on the proposed modeling scheme helps in determining the optimum dimensions of the gas cell, given the constraints of micro-fabrication. The carbon dioxide spectral signature is successfully measured using the proposed integrated multi-pass gas cell coupled with a MEMS-based spectrometer.

Identifiants

pubmed: 32354147
pii: mi11050463
doi: 10.3390/mi11050463
pmc: PMC7281756
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Agence Nationale de la Recherche
ID : ANR-16-IDEX-0003

Déclaration de conflit d'intérêts

Authors declare no conflicts of interest

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Auteurs

Alaa Fathy (A)

ESYCOM Lab, UMR 9007 CNRS, Univ Gustave Eiffel, 77454 Marne-la-Vallée, France.
Si-Ware Systems, 3 Khalid Ibn Al-Waleed St., Heliopolis, Cairo 11361, Egypt.

Yasser M Sabry (YM)

Si-Ware Systems, 3 Khalid Ibn Al-Waleed St., Heliopolis, Cairo 11361, Egypt.
Ain-Shams University, Faculty of Engineering, 1 Elsarayat St. Abbassia, Cairo 11517, Egypt.

Martine Gnambodoe-Capochichi (M)

ESYCOM Lab, UMR 9007 CNRS, Univ Gustave Eiffel, 77454 Marne-la-Vallée, France.

Frederic Marty (F)

ESYCOM Lab, UMR 9007 CNRS, Univ Gustave Eiffel, 77454 Marne-la-Vallée, France.

Diaa Khalil (D)

Si-Ware Systems, 3 Khalid Ibn Al-Waleed St., Heliopolis, Cairo 11361, Egypt.
Ain-Shams University, Faculty of Engineering, 1 Elsarayat St. Abbassia, Cairo 11517, Egypt.

Tarik Bourouina (T)

ESYCOM Lab, UMR 9007 CNRS, Univ Gustave Eiffel, 77454 Marne-la-Vallée, France.
Si-Ware Systems, 3 Khalid Ibn Al-Waleed St., Heliopolis, Cairo 11361, Egypt.

Classifications MeSH