Atomic Layer Deposition of Nitrogen-Doped Al Phosphate Coatings for Li-Ion Battery Applications.
aluminum phosphate
atomic layer deposition
lithium-ion battery
nitrogen doping
plasma-enhanced deposition
Journal
ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991
Informations de publication
Date de publication:
10 Jun 2020
10 Jun 2020
Historique:
pubmed:
12
5
2020
medline:
12
5
2020
entrez:
12
5
2020
Statut:
ppublish
Résumé
In situ nitrogen doping of aluminum phosphate has been investigated in two different plasma-enhanced atomic layer deposition (PE-ALD) processes. The first method consisted of the combination of trimethyl phosphate plasma (TMP*) with a nitrogen plasma and trimethyl aluminum (TMA), that is, TMP*-N
Identifiants
pubmed: 32392406
doi: 10.1021/acsami.0c05585
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM