Transition from freestanding SnO

finite element method simulation laterally aligned nanowires planar growth tin oxide vapor–liquid–solid nanowire growth

Journal

Beilstein journal of nanotechnology
ISSN: 2190-4286
Titre abrégé: Beilstein J Nanotechnol
Pays: Germany
ID NLM: 101551563

Informations de publication

Date de publication:
2020
Historique:
received: 19 02 2020
accepted: 07 05 2020
entrez: 20 6 2020
pubmed: 20 6 2020
medline: 20 6 2020
Statut: epublish

Résumé

In this study, we used simulations as a guide for experiments in order to switch freestanding nanowire growth to a laterally aligned growth mode. By means of finite element simulations, we determined that a higher volumetric flow and a reduced process pressure will result in a preferred laterally aligned nanowire growth. Furthermore, increasing the volumetric flow leads to a higher species dilution. Based on our numerical results, we were able to successfully grow laterally aligned SnO

Identifiants

pubmed: 32551209
doi: 10.3762/bjnano.11.69
pmc: PMC7277887
doi:

Types de publication

Journal Article

Langues

eng

Pagination

843-853

Informations de copyright

Copyright © 2020, Bürger et al.; licensee Beilstein-Institut.

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Auteurs

Jasmin-Clara Bürger (JC)

Laboratory for Nanotechnology, Department of Microsystems Engineering (IMTEK), University of Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany.

Sebastian Gutsch (S)

Laboratory for Nanotechnology, Department of Microsystems Engineering (IMTEK), University of Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany.

Margit Zacharias (M)

Laboratory for Nanotechnology, Department of Microsystems Engineering (IMTEK), University of Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany.

Classifications MeSH