High-performance thermochromic VO


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
06 Jul 2020
Historique:
received: 13 01 2020
accepted: 22 05 2020
entrez: 8 7 2020
pubmed: 8 7 2020
medline: 8 7 2020
Statut: epublish

Résumé

We report on high-performance thermochromic ZrO

Identifiants

pubmed: 32632200
doi: 10.1038/s41598-020-68002-5
pii: 10.1038/s41598-020-68002-5
pmc: PMC7338475
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

11107

Subventions

Organisme : Grantová Agentura České Republiky
ID : 17-08944S

Références

Morin, F. J. Oxides which show a metal-to-insulator transition at the Neel temperature. Phys. Rev. Lett. 3, 34–36 (1959).
doi: 10.1103/PhysRevLett.3.34
Wriedt, H. A. The O–V (oxygen–vanadium) system. Bull. Alloy Phase Diagr. 10, 271–277 (1989).
doi: 10.1007/BF02877512
Gao, Y. et al. Nanoceramic VO
doi: 10.1016/j.nanoen.2011.12.002
Granqvist, C. G. Recent progress in thermochromics and electrochromics: a brief survey. Thin Solid Films 614, 90–96 (2016).
doi: 10.1016/j.tsf.2016.02.029
Wang, S. et al. Recent progress in VO
doi: 10.1016/j.pmatsci.2016.03.001
Li, M., Magdassi, S., Gao, Y. & Long, Y. Hydrothermal synthesis of VO
doi: 10.1002/smll.201701147
Xu, F., Cao, X., Luo, H. & Jin, P. Recent advances in VO
doi: 10.1039/C7TC05768G
Chang, T.-C. et al. Review on thermochromic vanadium dioxide based smart coatings: from lab to commercial application. Adv. Manuf. 6, 1–19 (2018).
doi: 10.1007/s40436-017-0209-2
Fortier, J.-P., Baloukas, B., Zabeida, O., Klemberg-Sapieha, J. E. & Martinu, L. Thermochromic VO
doi: 10.1016/j.solmat.2014.03.007
Aijaz, A. et al. Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering. Sol. Energy Mater. Sol. Cells 149, 137–144 (2016).
doi: 10.1016/j.solmat.2016.01.009
Choi, Y., Jung, Y. & Kim, H. Low-temperature deposition of thermochromic VO
doi: 10.1016/j.tsf.2016.07.051
Sun, G. et al. Low-temperature deposition of VO
doi: 10.1016/j.solmat.2016.11.036
Chang, T. et al. Facile and low-temperature fabrication of thermochromic Cr
doi: 10.1021/acsami.7b07137
Saeli, M., Piccirillo, C., Parkin, I. P., Binions, R. & Ridley, I. Energy modelling studies of thermochromic glazing. Energy Build. 42, 1666–1673 (2010).
doi: 10.1016/j.enbuild.2010.04.010
Hu, L. et al. Porous W-doped VO
doi: 10.1007/s10971-015-3832-z
Baloukas, B., Loquai, S. & Martinu, L. VO
doi: 10.1016/j.solmat.2018.03.048
Wang, N., Goh, Q. S., Lee, P. L., Magdassi, S. & Long, Y. One-step hydrothermal synthesis of rare earth/W-codoped VO
doi: 10.1016/j.jallcom.2017.04.012
Dietrich, M. K., Kuhl, F., Polity, A. & Klar, P. J. Optimizing thermochromic VO
doi: 10.1063/1.4979700
Lu, L. et al. Effect of Fe doping on thermochromic properties of VO
doi: 10.1007/s10854-018-8518-1
Loquai, S., Baloukas, B., Klemberg-Sapieha, J. E. & Martinu, L. HiPIMS-deposited thermochromic VO
doi: 10.1016/j.solmat.2016.10.038
Chang, T. et al. Optical design and stability study for ultrahigh-performance and long-lived vanadium dioxide-based thermochromic coatings. Nano Energy 44, 256–264 (2018).
doi: 10.1016/j.nanoen.2017.11.061
Long, S. et al. Application-oriented VO
doi: 10.1016/j.solmat.2018.09.023
Vlček, J., Kolenatý, D., Houška, J., Kozák, T. & Čerstvý, R. Controlled reactive HiPIMS—effective technique for low-temperature (300 °C) synthesis of VO
doi: 10.1088/1361-6463/aa8356
Vlček, J. et al. Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO
doi: 10.1088/1361-6463/aae9c6
Bugyi, R., Vlcek, J., Rezek, J. & Lazar, J. High-rate reactive sputtering of dielectric stoichiometric films. Patent Nos. EP 2770083B1 (2015), US 9637814B2 (2017), CN 105264107B (2018), JP 6328150B2 (2018).
Gudmundsson, J. T., Brenning, N., Lundin, D. & Helmersson, U. High power impulse magnetron sputtering discharge. J. Vac. Sci. Technol. A 30, 030801 (2012).
doi: 10.1116/1.3691832
Gudmundsson, J. T. On reactive high power impulse magnetron sputtering. Plasma Phys. Control. Fusion 58, 014002 (2015).
doi: 10.1088/0741-3335/58/1/014002
Kolenatý, D. Low-temperature deposition of high-performance thermochromic VO
Vlček, J., Rezek, J., Houška, J., Kozák, T. & Kohout, J. Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO
doi: 10.1016/j.vacuum.2014.12.004
Rezek, J., Vlček, J., Houška, J., Čapek, J. & Baroch, P. Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO
doi: 10.1016/j.surfcoat.2017.09.015
Houska, J. et al. Significant improvement of the performance of ZrO
doi: 10.1016/j.solmat.2018.12.004
Nečas, D. & Klapetek, P. Gwyddion: an open-source software for SPM data analysis. Cent. Eur. J. Phys. 10, 181–188 (2012).
Available e.g. at https://rredc.nrel.gov/solar/spectra/am1.5/ . https://hyperphysics.phy-astr.gsu.edu/hbase/vision/efficacy.html .
Oberste-Berghaus, J., Van Nuffel, R., Gobin, G., De Jaeger, K., Das, A. & De Bosscher, W. Film properties of zirconium oxide top layers from rotatable targets. In: 58th Annual Technical Conference Proceedings of SVC 2015, pp. 228–234.
Chen, Z. et al. VO
doi: 10.1016/j.solmat.2011.05.041
Xu, G., Jin, P., Tazawa, M. & Yoshimura, K. Optimization of antireflection coating for VO
doi: 10.1016/j.solmat.2004.02.014
Ji, C. et al. High thermochromic performance of Fe/Mg co-doped VO
Zhang, J., He, H., Xie, Y. & Pan, B. Theoretical study on the tungsten-induced reduction of transition temperature and the degradation of optical properties for VO
doi: 10.1063/1.4795431
Romanyuk, A., Steiner, R., Marot, L. & Oelhafen, P. Temperature-induced metal-semiconductor transition in W-doped VO
doi: 10.1016/j.solmat.2007.06.013
JCPDS-ICDD, PDF-4+ Database, International Centre for Diffraction Data, Newton Square, PA, USA (2015).
Liang, Z. et al. Tungsten-doped vanadium dioxide thin films as smart windows with self-cleaning and energy-saving functions. J. Alloys Compd. 694, 124–131 (2017).
doi: 10.1016/j.jallcom.2016.09.315
Dai, L. et al. F-doped VO
doi: 10.1039/c3cp51359a
Chen, Z. et al. Fine crystalline VO
doi: 10.1039/c3ta14612j

Auteurs

David Kolenatý (D)

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republic.

Jaroslav Vlček (J)

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republic. vlcek@kfy.zcu.cz.

Tomáš Bárta (T)

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republic.

Jiří Rezek (J)

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republic.

Jiří Houška (J)

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republic.

Stanislav Haviar (S)

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republic.

Classifications MeSH