Extreme ultraviolet microscope characterization using photomask surface roughness.
Journal
Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288
Informations de publication
Date de publication:
15 Jul 2020
15 Jul 2020
Historique:
received:
24
05
2019
accepted:
28
06
2020
entrez:
17
7
2020
pubmed:
17
7
2020
medline:
17
7
2020
Statut:
epublish
Résumé
We demonstrate a method for characterizing the field-dependent aberrations of a full-field synchrotron-based extreme ultraviolet microscope. The statistical uniformity of the inherent, atomic-scale roughness of readily-available photomask blanks enables a self-calibrating computational procedure using images acquired under standard operation. We characterize the aberrations across a 30-um field-of-view, demonstrating a minimum aberration magnitude of smaller than [Formula: see text] averaged over the center 5-um area, with a measurement accuracy better than [Formula: see text]. The measured field variation of aberrations is consistent with system geometry and agrees with prior characterizations of the same system. In certain cases, it may be possible to additionally recover the illumination wavefront from the same images. Our method is general and is easily applied to coherent imaging systems with steerable illumination without requiring invasive hardware or custom test objects; hence, it provides substantial benefits when characterizing microscopes and high-resolution imaging systems in situ.
Identifiants
pubmed: 32669602
doi: 10.1038/s41598-020-68588-w
pii: 10.1038/s41598-020-68588-w
pmc: PMC7363931
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
11673Références
Hariharan, P., Oreb, B. & Eiju, T. Digital phase-shifting interferometry: a simple error-compensating phase calculation algorithm. Appl. Opt.26, 2504–2506. https://doi.org/10.1364/AO.26.002504 (1987).
doi: 10.1364/AO.26.002504
pubmed: 20489904
Rimmer, M. P. & Wyant, J. C. Evaluation of large aberrations using a lateral-shear interferometer having variable shear. Appl. Opt.14, 142–150. https://doi.org/10.1364/AO.14.000142 (1975).
doi: 10.1364/AO.14.000142
pubmed: 20134844
Bruning, J. H. et al. Digital wavefront measuring interferometer for testing optical surfaces and lenses. Appl. Opt.13, 2693–2703. https://doi.org/10.1364/AO.13.002693 (1974).
doi: 10.1364/AO.13.002693
pubmed: 20134757
Ronchi, V. Forty years of history of a grating interferometer. Appl. Opt.3, 437–451. https://doi.org/10.1364/AO.3.000437 (1964).
doi: 10.1364/AO.3.000437
Takeda, M., Ina, H. & Kobayashi, S. Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry. J. Opt. Soc. Am.72, 156–160. https://doi.org/10.1364/JOSA.72.000156 (1982).
doi: 10.1364/JOSA.72.000156
Malacara-Hernandez, D. Review of interferogram analysis methods. In Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection Vol. 1332 (ed. Grover, C. P.) 678–689 (International Society for Optics and Photonics, SPIE, 1991). https://doi.org/10.1117/12.51118 .
Malacara, D. Optical Shop Testing (Wiley Series in Pure and Applied Optics) (Wiley-Interscience, USA, 2007).
Tyson, R. K. Principles of Adaptive Optics (CRC, London, 2015).
doi: 10.1201/b19712
Babcock, H. W. Adaptive optics revisited. Science249, 253–257. https://doi.org/10.1126/science.249.4966.253 (1990).
doi: 10.1126/science.249.4966.253
pubmed: 17750109
Ji, N., Milkie, D. E. & Betzig, E. Adaptive optics via pupil segmentation for high-resolution imaging in biological tissues. Nat. Methods7, 141–147. https://doi.org/10.1038/nmeth.1411 (2010).
doi: 10.1038/nmeth.1411
pubmed: 20037592
Roorda, A. et al. Adaptive optics scanning laser ophthalmoscopy. Opt. Express10, 405–412. https://doi.org/10.1364/OE.10.000405 (2002).
doi: 10.1364/OE.10.000405
pubmed: 19436374
Hanser, B. M., Gustafsson, M. G., Agard, D. & Sedat, J. W. Phase-retrieved pupil functions in wide-field fluorescence microscopy. J. Microsc.216, 32–48. https://doi.org/10.1111/j.0022-2720.2004.01393.x (2004).
doi: 10.1111/j.0022-2720.2004.01393.x
pubmed: 15369481
Fienup, J. R., Marron, J. C., Schulz, T. J. & Seldin, J. H. Hubble space telescope characterized by using phase-retrieval algorithms. Appl. Opt.32, 1747–1767. https://doi.org/10.1364/AO.26.002504 0 (1993).
doi: 10.1364/AO.32.001747
pubmed: 20820308
Miyakawa, R. et al. AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature. In Extreme Ultraviolet (EUV) Lithography V Vol. 9048 (eds II, O. R. W. & Panning, E. M.) 90483A (International Society for Optics and Photonics, SPIE, 2014). https://doi.org/10.1117/12.2048389 .
Miyakawa, R. & Naulleau, P. Preparing for the next generation of euv lithography at the center for X-ray optics. Synchrotron Radiat. News32, 15–21. https://doi.org/10.1080/08940886.2019.1634432 (2019).
doi: 10.1080/08940886.2019.1634432
Mochi, I., Goldberg, K. A., Naulleau, P. & Huh, S. Improving the performance of the actinic inspection tool with an optimized alignment procedure. In Alternative Lithographic Technologies Vol. 7271 (eds Schellenberg, F. M. & Fontaine, B. M. L.) 727123 (International Society for Optics and Photonics, SPIE, 2009). https://doi.org/10.1117/12.814261 .
Yamazoe, K., Mochi, I. & Goldberg, K. A. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source. J. Opt. Soc. Am. A31, B34. https://doi.org/10.1364/JOSAA.31.000B34 (2014).
doi: 10.1364/JOSAA.31.000B34
Levinson, Z. et al. Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology. J. Micro/Nanolithogr. MEMS MOEMS. https://doi.org/10.1117/1.JMM.15.2.023508 (2016).
Ruoff, J. Impact of mask topography and multilayer stack on high NA imaging of EUV masks. SPIE Photomask Technol.7823, 78231N. https://doi.org/10.1117/12.864120 (2010).
doi: 10.1117/12.864120
Raghunathan, S. et al. Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images. J. Vacuum Sci. Technol. B Nanotechnol. Microelectron. Mater. Process. Meas. Phenomena32, 06F801. https://doi.org/10.1116/1.4901876 (2014).
doi: 10.1116/1.4901876
Goldberg, K. A. Commissioning an EUV mask microscope for lithography generations reaching 8 nm. In Extreme Ultraviolet (EUV) Lithography IV Vol. 8679 (ed. Naulleau, P. P.) 867919–867919–10 (2013). https://doi.org/10.1117/12.2011688 .
Naulleau, P. et al. Extreme ultraviolet mask roughness: requirements, characterization, and modeling. In Photomask and Next-Generation Lithography Mask Technology XXI Vol. 9256 (ed. Kato, K.) 92560J (International Society for Optics and Photonics, SPIE, 2014). https://doi.org/10.1117/12.2070303 .
Wang, Y.-G. Key Challenges in EUV Mask Technology: Actinic Mask Inspection and Mask 3D Effects. Ph.D. thesis, UC Berkeley (2017).
Gunjala, G., Shanker, A., Jaedicke, V., Antipa, N. & Waller, L. Optical transfer function characterization using a weak diffuser. SPIE BiOS971315 https://doi.org/10.1117/12.2213271 (2016).
Gunjala, G., Sherwin, S., Shanker, A. & Waller, L. Aberration recovery by imaging a weak diffuser. Opt. Express26, 21054–21068. https://doi.org/10.1364/AO.26.002504 5 (2018).
doi: 10.1364/OE.26.021054
pubmed: 30119411
Zemlin, F., Weiss, K., Schiske, P., Kunath, W. & Herrmann, K.-H. Coma-free alignment of high resolution electron microscopes with the aid of optical diffractograms. Ultramicroscopy3, 49–60 (1978).
doi: 10.1016/S0304-3991(78)80006-0
Voelkl, E. Using diffractograms to evaluate optical systems with coherent illumination. Opt. Lett.28, 2318–2320. https://doi.org/10.1364/AO.26.002504 6 (2003).
doi: 10.1364/OL.28.002318
pubmed: 14680168
Spence, J. C. Experimental High-Resolution Electron Microscopy (Oxford University, Oxford, 1988).
Erni, R. Aberration-Corrected Imaging in Transmission Electron Microscopy: An Introduction (World Scientific, Singapore, 2010).
doi: 10.1142/p703
Naulleau, P. P., Goldberg, K. A., Batson, P., Bokor, J. & Denham, P. E. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography. Appl. Opt.42, 820–826. https://doi.org/10.1364/AO.26.002504 7 (2003).
doi: 10.1364/AO.42.000820
pubmed: 12593485
Goodman, J. Introduction to Fourier Optics (McGraw-Hill, London, 2008).
George, S. A. et al. Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning. J. Vacuum Sci. Technol. B Microelectron. Nanometer Struct.28, C6E23. https://doi.org/10.1116/1.3502436 (2010).
doi: 10.1116/1.3502436
Hamilton, D. K., Sheppard, C. J. R. & Wilson, T. Improved imaging of phase gradients in scanning optical microscopy. J. Microsc.135, 275–286. https://doi.org/10.1364/AO.26.002504 9 (1984).
doi: 10.1111/j.1365-2818.1984.tb02533.x
Streibl, N. Three-dimensional imaging by a microscope. JOSA A2, 121–127. https://doi.org/10.1364/AO.14.000142 0 (1985).
doi: 10.1364/JOSAA.2.000121
Rose, H. Nonstandard imaging methods in electron microscopy. Ultramicroscopy2, 251–267. https://doi.org/10.1364/AO.14.000142 1 (1976).
doi: 10.1016/S0304-3991(76)91538-2
Eckert, R., Phillips, Z. F. & Waller, L. Efficient illumination angle self-calibration in fourier ptychography. Appl. Opt.57, 5434–5442. https://doi.org/10.1364/AO.14.000142 2 (2018).
doi: 10.1364/AO.57.005434
pubmed: 30117837
Goldberg, K. A., Mochi, I., Naulleau, P. P., Han, H. & Huh, S. Benchmarking EUV mask inspection beyond 0.25 NA. 7122, 71222E. https://doi.org/10.1117/12.801529 (2008).
Naulleau, P. P., Mochi, I. & Goldberg, K. A. Optical modeling of Fresnel zoneplate microscopes. Appl. Opt.50, 3678–84. https://doi.org/10.1364/AO.14.000142 3 (2011).
doi: 10.1364/AO.50.003678
pubmed: 21743581
Goldberg, K. A. et al. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm. In SPIE Vol. 7969 (ed. Rieger, M. L.) 796910–796910–12 (2011). https://doi.org/10.1117/12.881651 .
Goldberg, K. A., Benk, M. P., Wojdyla, A., Johnson, D. G. & Donoghue, A. P. New ways of looking at masks with the SHARP EUV microscope. In Proc. SPIE Vol. 9422 (eds Wood, O. R. & Panning, E. M.) 94221A (2015). https://doi.org/10.1117/12.2175553 .
Wright, S. & Nocedal, J. Numerical Optimization (Springer Science, London, 1999).