Impact and behavior of Sn during the Ni/GeSn solid-state reaction.
GeSn
Ni
Sn segregation
X-ray diffraction
solid-state reaction
transmission electron microscopy
Journal
Journal of applied crystallography
ISSN: 0021-8898
Titre abrégé: J Appl Crystallogr
Pays: United States
ID NLM: 9876190
Informations de publication
Date de publication:
01 Jun 2020
01 Jun 2020
Historique:
received:
11
12
2019
accepted:
04
03
2020
entrez:
21
7
2020
pubmed:
21
7
2020
medline:
21
7
2020
Statut:
epublish
Résumé
Ni-based intermetallics are promising materials for forming efficient contacts in GeSn-based Si photonic devices. However, the role that Sn might have during the Ni/GeSn solid-state reaction (SSR) is not fully understood. A comprehensive analysis focused on Sn segregation during the Ni/GeSn SSR was carried out.
Identifiants
pubmed: 32684875
doi: 10.1107/S1600576720003064
pii: vh5112
pmc: PMC7312141
doi:
Types de publication
Journal Article
Langues
eng
Pagination
605-613Informations de copyright
© International Union of Crystallography 2020.