Memtransistors Based on Nanopatterned Graphene Ferroelectric Field-Effect Transistors.

HfO2-based ferroelectrics graphene memtransistors

Journal

Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216

Informations de publication

Date de publication:
19 Jul 2020
Historique:
received: 30 06 2020
revised: 14 07 2020
accepted: 16 07 2020
entrez: 26 7 2020
pubmed: 28 7 2020
medline: 28 7 2020
Statut: epublish

Résumé

The ultimate memristor, which acts as resistive memory and an artificial neural synapse, is made from a single atomic layer. In this manuscript, we present experimental evidence of the memristive properties of a nanopatterned ferroelectric graphene field-effect transistor (FET). The graphene FET has, as a channel, a graphene monolayer transferred onto an HfO

Identifiants

pubmed: 32707647
pii: nano10071404
doi: 10.3390/nano10071404
pmc: PMC7408462
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Unitatea Executiva pentru Finantarea Invatamantului Superior, a Cercetarii, Dezvoltarii si Inovarii
ID : PN-III-P4-ID-PCCF-2016-0033 "Grapheneferro"

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Auteurs

Mircea Dragoman (M)

National Institute for Research and Development in Microtechnology (IMT), Str. Erou Iancu Nicolae 126 A, 077191 Voluntari, Romania.

Adrian Dinescu (A)

National Institute for Research and Development in Microtechnology (IMT), Str. Erou Iancu Nicolae 126 A, 077191 Voluntari, Romania.

Florin Nastase (F)

National Institute for Research and Development in Microtechnology (IMT), Str. Erou Iancu Nicolae 126 A, 077191 Voluntari, Romania.

Daniela Dragoman (D)

Physics Faculty, University of Bucharest, P.O. Box MG-11, 077125 Bucharest, Romania.
Academy of Romanian Scientists, Str. Ilfov, Nr. 3, 050044 Bucharest, Romania.

Classifications MeSH